Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.33 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL651595 | 0.86 | TSHR (0.43) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL6129169 | 0.81 | ALDH1A1 (0.36) | ALDH1A1TSHRTHRB | |
| SCHEMBL15119439 | 0.80 | TSHR (0.38) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL1970273 | 0.78 | TSHR (0.45) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL6129175 | 0.78 | ALDH1A1 (0.30) | ALDH1A1TSHR | |
| SCHEMBL8814067 | 0.77 | ALDH1A1 (0.50) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL9626812 | 0.77 | TSHR (0.39) | TSHRMEN1KMT2ATHRBHTT | |
| SCHEMBL18250968 | 0.76 | TSHR (0.43) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Di(Hydroxyethyl)Ether SCHEMBL4137670 | 0.76 | ALDH1A1 (0.55) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL2066528 | 0.76 | ALDH1A1 (0.48) | ALDH1A1TSHRMAPK1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230096077-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME | LTC CO., LTD (KR) | 2023-03-30 | — | — | US | claimed |
| CN-115236939-A | Positive photoresist composition for organic insulating film of high-aperture-ratio liquid crystal display element | 烟台希尔德材料科技有限公司 | 2022-10-25 | — | — | CN | claimed |
| CN-108473682-B | Polysilsesquioxane resin composition for flexible substrate | LTC有限公司 | 2021-04-27 | — | — | CN | claimed |
| US-10934455-B2 | Polysilsesquioxane resin composition for flexible substrate | LTC CO., LTD. | 2021-03-02 | — | — | US | claimed |
| US-10494483-B2 | Photosensitive resin composition, organic light emitting display device including the same, and method for manufacturing organic light emitting display device | SAMSUNG DISPLAY CO., LTD. (KR) | 2019-12-03 | — | — | US | claimed |
| US-10409162-B2 | Highly heat resistant polysilsesquioxane-based photosensitive resin composition | LTC CO., LTD. (KR) | 2019-09-10 | — | — | US | claimed |
| CN-104276601-B | The method of composition and formation tin oxide semiconductor film for tin oxide semiconductor | 三星显示有限公司 | 2019-02-19 | — | — | CN | claimed |
| US-20190023942-A1 | POLYSILSESQUIOXANE RESIN COMPOSITION FOR FLEXIBLE SUBSTRATE | LTC CO., LTD. (KR) | 2019-01-24 | — | — | US | claimed |
| CN-105658702-B | High-fire resistance polysilsesquioxane class photosensitive polymer combination | LTC有限公司 | 2018-08-07 | — | — | CN | claimed |
| US-20170226294-A1 | PHOTOSENSITIVE RESIN COMPOSITION, ORGANIC LIGHT EMITTING DISPLAY DEVICE INCLUDING THE SAME, AND METHOD FOR MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY DEVICE | SAMSUNG DISPLAY CO., LTD. (KR) | 2017-08-10 | — | — | US | claimed |
| US-9697931-B2 | Method of preparing large-area, three-dimensional graphene transparent electrode using electrospray process and large-area, three-dimensional graphene transparent electrode prepared therefrom | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2017-07-04 | — | — | US | claimed |
| US-20170166700-A1 | HIGHLY HEAT RESISTANT POLYSILSESQUIOXANE-BASED PHOTOSENSITIVE RESIN COMPOSITION | LTC CO., LTD. (KR) | 2017-06-15 | — | — | US | claimed |
| US-20150321215-A1 | METHOD OF PREPARING LARGE-AREA, THREE-DIMENSIONAL GRAPHENE TRANSPARENT ELECTRODE USING ELECTROSPRAY PROCESS AND LARGE-AREA, THREE-DIMENSIONAL GRAPHENE TRANSPARENT ELECTRODE PREPARED THEREFROM | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2015-11-12 | — | — | US | claimed |
| CN-100538517-C | Negative resist composition for organic insulating layer of high aperture LCD | ADMS TECHNOLOGY CO LTD (KR) | 2009-09-09 | — | — | CN | claimed |
| US-7514203-B2 | Positive photoresist composition | SAMYANGEMS CO., LTD. (KR) | 2009-04-07 | — | — | US | claimed |
| US-20080166656-A1 | Positive Photoresist Composition | SAM YANG EMS CO., LTD. | 2008-07-10 | — | — | US | claimed |
| WO-2007069798-A1 | POSITIVE PHOTORESIST COMPOSITION | SAMYANGEMS CO., LTD. (KR) | 2007-06-21 | — | — | WO | claimed |
| CN-1781057-A | Negative resist composition for organic insulating layer of high aperture LCD | ADMS TECHNOLOGY CO LTD (KR) | 2006-05-31 | — | — | CN | claimed |
| WO-2024025201-A1 | ALIPHATIC BIFUNCTIONAL ACRYLIC MONOMER AND LOW-PERMITTIVITY COATING LIQUID COMPOSITION INCLUDING SAME | 주식회사 트리엘 | 2024-02-01 | — | — | WO | disclosed |
| US-4352691-A | WATER-SOLUBLE DYE, WETTING AGENT, ALKALI METAL HYDROXIDE, WATER | SHINSHU SEIKI KABUSHIKI KAISHA (JP) | 1982-10-05 | — | — | US | disclosed |