Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 4/20 | 0.62 |
| ▸ | PKM | P14618 | 3/20 | 0.59 |
| ▸ | POLB | P06746 | 1/20 | 0.59 |
| ▸ | MAPT | P10636 | 1/20 | 0.59 |
| ▸ | GAA | P10253 | 2/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | ATM | Q13315 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.40 |
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1232411 | 0.93 | PKM (0.67) | ELANEPKMPOLBMAPTGAA | |
| SCHEMBL72362 | 0.88 | ELANE (0.61) | ELANEMAPTGAAKMT2AATM | |
| SCHEMBL9703386 | 0.87 | PKM (0.59) | ELANEPKMPOLBMAPTGAA | |
| SCHEMBL3118881 | 0.85 | ELANE (0.63) | ELANEPKMPOLBMAPTGAA | |
| SCHEMBL3402161 | 0.84 | ELANE (0.50) | ELANEPKMPOLBMAPTGAA | |
| SCHEMBL217004 | 0.83 | ELANE (0.56) | ELANEMAPTGAAKMT2AATM | |
| Methacrylic Acid SCHEMBL8512987 | 0.83 | ELANE (0.60) | ELANEPOLBMAPTGAAKMT2A | |
| SCHEMBL14227007 | 0.83 | PKM (0.85) | ELANEPKMPOLBMAPTGAA | |
| SCHEMBL9222127 | 0.82 | PKM (0.53) | ELANEPKMPOLBMAPTKMT2A | |
| SCHEMBL1436154 | 0.81 | ELANE (0.54) | ELANEPKMPOLBMAPTGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220169060-A1 | THERMOSENSITIVE RECORDING MEDIUM AND IMAGE-FORMING METHOD | CANON KABUSHIKI KAISHA (JP) | 2022-06-02 | — | — | US | disclosed |
| CN-100346230-C | Material for preservative formation | TOKYO O KAGAKU KOGYO CO LTD (JP) | 2007-10-31 | — | — | CN | disclosed |
| US-6599682-B2 | Controlling refractive index and light absorption coefficient of the antireflection coating film by appropriately selecting the types of compositions; films thickness very small | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-07-29 | — | — | US | disclosed |
| CN-1388414-A | Material for preservative formation | TOKYO O KAGAKU KOGYO CO LTD (JP) | 2003-01-01 | — | — | CN | disclosed |
| US-20010044080-A1 | Method for forming a finely patterned photoresist layer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-22 | — | — | US | disclosed |
| US-6083665-A | Photoresist laminate and method for patterning using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-04 | — | — | US | disclosed |
| US-5925495-A | Photoresist laminate and method for patterning using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-20 | — | — | US | disclosed |