Butane

Butane

SCHEMBL7209999

CCCC.CCCOBO

nearest known ligand 0.31

Full drug profile on Sugi Atlas →

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL845310 0.97
Butane SCHEMBL20590977 0.78
Biphenyl SCHEMBL7215819 0.77 LMNA (0.41)
SCHEMBL13835753 0.75
SCHEMBL21581256 0.75 THRB (0.44) HSD17B10
SCHEMBL21581268 0.75 THRB (0.44) HSD17B10
SCHEMBL21581249 0.75 THRB (0.44) HSD17B10
SCHEMBL8609239 0.69
SCHEMBL115628 0.69
Butane SCHEMBL20591002 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10242874-B2 Diffusing agent composition and method of manufacturing semiconductor substrate TOKYO OHKA KOGYO CO., LTD. (JP) 2019-03-26 US disclosed
US-20180374704-A1 DIFFUSING AGENT COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2018-12-27 US disclosed
EP-0974595-B1 PROCESS FOR PRODUCING BORON COMPOUNDS SHOWA DENKO KK (JP) 2003-10-01 EP disclosed
US-6140537-A REACTING AN ORGANIC OXYBORON COMPOUND WITH LITHIUM, MAGNESIUM, OR COMPOUND THEREOF; FORMING BORON ANION COMPOUND; ION EXCHANGING SHOWA DENKO K.K. (JP) 2000-10-31 US disclosed
EP-0974595-A1 PROCESS FOR PRODUCING BORON COMPOUNDS Showa Denko Kabushiki Kaisha (JP) 2000-01-26 EP disclosed