SCHEMBL721027

SCHEMBL721027

CC=CC(=O)OCC(O)COc1ccc(C(C)C)cc1

nearest known ligand 0.48

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.48
KMT2A Q03164 2/20 0.47
MAPT P10636 5/20 0.47
LMNA P02545 3/20 0.47
POLB P06746 2/20 0.47
NPSR1 Q6W5P4 1/20 0.47
SMN1; SMN2 Q16637 2/20 0.46
MEN1 O00255 1/20 0.45
MAPK1 P28482 2/20 0.43
GAA P10253 1/20 0.42
HTT P42858 1/20 0.42
ALDH1A1 P00352 2/20 0.41
RXRA P19793 1/20 0.41
RXRB P28702 1/20 0.41
FKBP1A P62942 1/20 0.40
RAB9A P51151 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7545763 0.88 ALDH1A1 (0.50) CYP1A2KMT2AMAPTLMNAPOLB
SCHEMBL10336222 0.87 POLB (0.44) CYP1A2KMT2AMAPTLMNAPOLB
SCHEMBL3371591 0.86 LMNA (0.42) CYP1A2KMT2AMAPTLMNAPOLB
SCHEMBL3194813 0.85 LMNA (0.48) CYP1A2MAPTLMNAPOLBNPSR1
SCHEMBL13205122 0.85 CYP1A2 (0.49) CYP1A2KMT2AMAPTLMNAPOLB
SCHEMBL9177632 0.85 MEN1 (0.49) CYP1A2KMT2AMAPTLMNAPOLB
SCHEMBL941494 0.84 MAPT (0.47) CYP1A2MAPTLMNAPOLBNPSR1
SCHEMBL7517507 0.83 POLB (0.46) CYP1A2KMT2AMAPTLMNAPOLB
SCHEMBL59992 0.83 HTT (0.52) CYP1A2KMT2AMAPTLMNAPOLB
SCHEMBL7934548 0.82 MAPT (0.44) CYP1A2KMT2AMAPTLMNAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US claimed
US-5250385-A Photosensitivity, storage stability FUJI PHOTO FILM CO., LTD. (JP) 1993-10-05 US claimed
WO-2021059846-A1 NEAR-INFRARED ABSORPTION COMPOSITION, FILM, OPTICAL FILTER AND MANUFACTURING METHOD THEREOF, SOLID-STATE IMAGING ELEMENT, INFRARED SENSOR, CAMERA MODULE, AND INKJET INK 富士フイルム株式会社 2021-04-01 WO disclosed
WO-2021039253-A1 COMPOSITION, FILM, OPTICAL FILTER AND METHOD FOR PRODUCING SAME, SOLID-STATE IMAGING ELEMENT, INFRARED SENSOR AND SENSOR MODULE 富士フイルム株式会社 2021-03-04 WO disclosed
US-10780679-B2 Laminate, method for manufacturing laminate, semiconductor device, and method for manufacturing the semiconductor device FUJIFILM CORPORATION (JP) 2020-09-22 US disclosed
US-20180222164-A1 LAMINATE, METHOD FOR MANUFACTURING LAMINATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2018-08-09 US disclosed
EP-2275258-B1 Method of preparing lithographic printing plate FUJIFILM CORP (JP) 2017-07-26 EP disclosed
EP-2503393-B2 Method for preparation of lithographic printing plate FUJIFILM CORP (JP) 2016-07-20 EP disclosed
EP-2131239-B1 Processing liquid for lithographic printing plate development and method of producing lithographic printing plates FUJIFILM CORP (JP) 2016-03-23 EP disclosed
CN-103339537-B Light-shielding composition, method for producing same, solder resist, and method for forming pattern FUJIFILM CORP. (JP) 2016-02-03 CN disclosed
US-8603729-B2 Lithographic printing plate precursor and plate making method thereof FUJIFILM CORPORATION (JP) 2013-12-10 US disclosed
EP-1081552-A1 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2001-03-07 EP disclosed
EP-1048982-A1 Photopolymerizable composition for short wavelenght semiconductor laser exposure, photosensitive composition and method for polymerizing photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-11-02 EP disclosed
EP-0520364-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 1997-09-17 EP disclosed
EP-0377321-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 1995-03-22 EP disclosed
US-5385807-A Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1995-01-31 US disclosed
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US disclosed
US-5250385-A Photosensitivity, storage stability FUJI PHOTO FILM CO., LTD. (JP) 1993-10-05 US disclosed
EP-0520364-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1992-12-30 EP disclosed
EP-0377321-A2 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1990-07-11 EP disclosed