SCHEMBL7211715

SCHEMBL7211715

CCCCN(CCCC)CCCC.CCCCS(=O)(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.41
CA12 O43570 2/20 0.40
CA1 P00915 2/20 0.40
CA9 Q16790 2/20 0.40
EPHX2 P34913 1/20 0.39
KDM5A P29375 3/20 0.38
NPSR1 Q6W5P4 2/20 0.37
LMNA P02545 2/20 0.37
TP53 P04637 2/20 0.37
NPC1 O15118 1/20 0.37
S1PR2 O95136 1/20 0.37
S1PR4 O95977 1/20 0.37
ALDH1A1 P00352 1/20 0.37
POLB P06746 1/20 0.37
MAPT P10636 1/20 0.37
HPGD P15428 1/20 0.37
XBP1 P17861 1/20 0.37
S1PR1 P21453 1/20 0.37
MAPK1 P28482 1/20 0.37
AGTR1 P30556 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14750206 0.95 APP (0.41) APPCA12CA1CA9EPHX2
SCHEMBL29774219 0.95 APP (0.41) APPCA12CA1CA9EPHX2
SCHEMBL18049426 0.91 CA12 (0.40) APPCA12CA1CA9EPHX2
SCHEMBL13359386 0.91 CA12 (0.40) APPCA12CA1CA9EPHX2
SCHEMBL28566534 0.90 ALDH1A1 (0.39) APPCA12CA1CA9EPHX2
SCHEMBL4644169 0.88 CA1 (0.44) CA12CA1CA9KDM5ANPSR1
SCHEMBL23268445 0.88 APP (0.35) APPCA12CA1CA9EPHX2
SCHEMBL8816521 0.87 EPHX2 (0.44) APPCA12CA1CA9EPHX2
SCHEMBL30949863 0.87 EPHX2 (0.44) APPCA12CA1CA9EPHX2
SCHEMBL16316707 0.87 EPHX2 (0.44) APPCA12CA1CA9EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108693713-A Resist lower layer membrane material, pattern forming method and resist lower membrane forming method 信越化学工业株式会社 2018-10-23 CN disclosed
CN-108693705-A Resist lower layer membrane material, pattern forming method and resist lower membrane forming method 信越化学工业株式会社 2018-10-23 CN disclosed
EP-1290106-A1 ANTISTATIC AGENT Bayer Aktiengesellschaft (DE) 2003-03-12 EP disclosed
WO-2001085869-A1 ANTISTATIC AGENT BAYER AKTIENGESELLSCHAFT (DE) 2001-11-15 WO disclosed