Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2622744 | 0.76 | — | — | |
| SCHEMBL620424 | 0.67 | THRB (0.35) | THRB | |
| SCHEMBL10694715 | 0.67 | — | — | |
| SCHEMBL4585840 | 0.67 | — | — | |
| SCHEMBL6745244 | 0.67 | THRB (0.43) | ALDH1A1THRB | |
| SCHEMBL263794 | 0.64 | — | — | |
| Tert-Butanol SCHEMBL282 | 0.61 | — | — | |
| Tert-Butanol SCHEMBL20503401 | 0.61 | ALDH1A1 (0.46) | ALDH1A1THRB | |
| SCHEMBL39492 | 0.61 | — | — | |
| Tert-Butanol SCHEMBL788666 | 0.61 | ALDH1A1 (0.46) | ALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6607867-B1 | Silicon wafer coatings comprising addition terpolymers and photosensitive acid generators having high aspect ratio, contrast and resolution | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2003-08-19 | — | — | US | disclosed |
| US-6103448-A | Organometal-containing acrylate or methacrylate derivatives and photoresists containing the polymers thereof | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2000-08-15 | — | — | US | disclosed |
| US-5024916-A | Dry developable photoresist | CIBA-GEIGY CORPORATION (US) | 1991-06-18 | — | — | US | disclosed |
| US-4965316-A | ORGANOMETALLIC CONTAINING POLYMERS | CIBA-GEIGY CORPORATION (US) | 1990-10-23 | — | — | US | disclosed |
| US-4916247-A | INTERMEDIATES FOR POLYMERS SUITABLE FOR PHOTORESISTS; OXYGEN RESISTANT | CIBA-GEIGY CORPORATION (US) | 1990-04-10 | — | — | US | disclosed |
| EP-0307353-A2 | Organometal-containing polymers and their use | CIBA-GEIGY AG (CH) | 1989-03-15 | — | — | EP | disclosed |
| EP-0307356-A2 | Organometallic compounds | CIBA-GEIGY AG (CH) | 1989-03-15 | — | — | EP | disclosed |