SCHEMBL7212939

SCHEMBL7212939

CC(OC=O)OCCc1ccc(C(C)(C)C)cc1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.47
TSHR P16473 1/20 0.47
GRIA4 P48058 1/20 0.42
MITF O75030 1/20 0.38
KCNH2 Q12809 1/20 0.37
GPR84 Q9NQS5 1/20 0.37
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
ESRRG P62508 3/20 0.35
SLC13A5 Q86YT5 2/20 0.35
DAO P14920 1/20 0.35
ESRRB O95718 2/20 0.35
EPHX1 P07099 1/20 0.35
NR1H4 Q96RI1 1/20 0.35
SIGMAR1 Q99720 1/20 0.34
ANPEP P15144 1/20 0.34
ERAP2 Q6P179 1/20 0.34
LMNA P02545 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3366006 0.84 TP53 (0.50) TP53TSHRGRIA4GPR84CA1
SCHEMBL97918 0.81 MEN1 (0.42) CA1CA2EPHX1
SCHEMBL3366891 0.79 GRIA4 (0.42) TP53TSHRGRIA4MITFKCNH2
SCHEMBL3361820 0.77 TP53 (0.47) TP53TSHRGRIA4MITFKCNH2
SCHEMBL7218355 0.72 TSHR (0.42) TP53TSHRCA1CA2NR1H4
SCHEMBL683173 0.71 KCNH2 (0.49) TP53TSHRGRIA4MITFKCNH2
SCHEMBL793588 0.70 KCNH2 (0.50) TP53TSHRGRIA4MITFKCNH2
SCHEMBL19894770 0.69 TP53 (0.69) TP53TSHRGRIA4KCNH2GPR84
SCHEMBL1890232 0.69 KCNH2 (0.48) GRIA4MITFKCNH2ESRRGSLC13A5
SCHEMBL6423516 0.68 TSHR (0.44) TP53TSHRGRIA4CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed