⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL650813 | 0.92 | — | — | |
| SCHEMBL707727 | 0.82 | — | — | |
| SCHEMBL126009 | 0.82 | LMNA (0.31) | — | |
| SCHEMBL2267984 | 0.79 | — | — | |
| Fluoride SCHEMBL27660693 | 0.78 | — | — | |
| SCHEMBL704572 | 0.78 | — | — | |
| Hydrochloric Acid SCHEMBL3749298 | 0.78 | — | — | |
| SCHEMBL3773266 | 0.77 | — | — | |
| SCHEMBL705843 | 0.75 | — | — | |
| SCHEMBL704312 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 183 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | claimed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | claimed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | claimed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | claimed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | claimed |
| CN-111936505-B | Tertiary alkyl-substituted polycyclic aromatic compounds and uses thereof | 学校法人关西学院 | 2024-07-02 | — | — | CN | disclosed |
| CN-118221707-A | Polycyclic aromatic compound, organic electroluminescent element, display device, and lighting device | 国立大学法人京都大学 | 2024-06-21 | — | — | CN | disclosed |
| CN-118221706-A | Polycyclic aromatic compound, organic electroluminescent element, display device, and lighting device | 国立大学法人京都大学 | 2024-06-21 | — | — | CN | disclosed |
| CN-118108749-A | Polycyclic aromatic compound, organic electroluminescent element, display device, and lighting device | 国立大学法人京都大学 | 2024-05-31 | — | — | CN | disclosed |
| CN-118027048-A | Nitrogen-containing heteropolycyclic compound, material, element, display device, and lighting device | 爱思开新材料捷恩智株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-113412265-B | Polycyclic aromatic compounds | 学校法人关西学院 | 2024-05-03 | — | — | CN | disclosed |
| CN-117886837-A | Polycyclic aromatic compound, organic electroluminescent element, display device, and lighting device | 国立大学法人京都大学 | 2024-04-16 | — | — | CN | disclosed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | disclosed |
| US-20040002576-A1 | Polymer compound and polymer light emitting device using the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-01-01 | — | — | US | disclosed |
| US-6649314-B1 | Forming latent image; toner developing; charge erasing to remove residual surface charge; transferring image to receiver | NEXPRESS SOLUTIONS LLC | 2003-11-18 | — | — | US | disclosed |
| US-20030168656-A1 | New polymer and polymer light-emitting device using the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2003-09-11 | — | — | US | disclosed |
| US-4892962-A | FROM ALLYL DIFLUOROACETATES AND A MONOCHLORO=SILANE, ADDITION POLYMERS | CIBA-GEIGY CORPORATION (US) | 1990-01-09 | — | — | US | disclosed |
| EP-0143385-B1 | PHOSPHORYLISED GLYCOSIL AMIDES, UREAS, CARBAMATES AND THIOCARBAMATES, METHOD FOR THEIR PREPARATION AND THEIR USE | BAYER AG (DE) | 1989-03-15 | — | — | EP | disclosed |
| US-4686208-A | Phosphorylated glycosyl-amides, -ureas, -carbamates and -thiocarbamates and method of use | BAYER AKTIENGESELLSCHAFT (DE) | 1987-08-11 | — | — | US | disclosed |
| EP-0143385-A2 | Phosphorylised glycosil amides, ureas, carbamates and thiocarbamates, method for their preparation and their use | BAYER AG (DE) | 1985-06-05 | — | — | EP | disclosed |