Hydrochloric Acid

Hydrochloric Acid

SCHEMBL7217341

CC1=CC2=C(CCCC2)C1[Zr+2](C1C(C)=CC2=C1CCCC2)[GeH](C)C.[Cl-].[Cl-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL7719971 0.76
Hydrochloric Acid SCHEMBL4852944 0.76
Hydrochloric Acid SCHEMBL7189002 0.69
Hydrochloric Acid SCHEMBL2353560 0.68
Hydrochloric Acid SCHEMBL7835035 0.68
Hydrochloric Acid SCHEMBL6252962 0.68
SCHEMBL6249651 0.67 NOS3 (0.30)
Hydrochloric Acid SCHEMBL2355566 0.67
SCHEMBL6250420 0.66
SCHEMBL2476674 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6515037-B2 A molded foam using a copolymer of propylene and an alpha-omega diene having been polymerized in the presence of a metallocene supported catalyst and foaming agent; uniform and fine foamed cells; high foaming magnification; extrusion CHISSO CORPORATION (JP) 2003-02-04 US disclosed
US-6337372-B1 ADDITIOIN POLYMERIZATION OF OLEFINS AND PROPYLENE FOR BLOCK POLYMERS CHISSO CORPORATION (JP) 2002-01-08 US disclosed
US-20010020045-A1 Polypropylene base resin composition for foam-molding, foamed article using the same composition, production process for the same foamed article and foam-molded product using the foamed-article CHISSO CORPORATION 2001-09-06 US disclosed