Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | BCHE | P06276 | 1/20 | 0.32 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trolamine SCHEMBL27619468 | 0.96 | MAPT (0.47) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL28156459 | 0.92 | MAPT (0.50) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL1146 | 0.91 | MAPT (0.47) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL4748243 | 0.91 | MAPT (0.47) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL434089 | 0.91 | MAPT (0.47) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL15845959 | 0.91 | MAPT (0.47) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL7210416 | 0.89 | MAPT (0.42) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL8616286 | 0.89 | MAPT (0.42) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL29234278 | 0.89 | MAPT (0.42) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL11800024 | 0.88 | MAPT (0.47) | MAPTHPGDMAPK1CYP1A2CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160252819-A1 | MODIFIED-RESIST STRIPPER, METHOD FOR STRIPPING MODIFIED RESIST USING SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR-SUBSTRATE PRODUCT | FUJIFILM CORPORATION (JP) | 2016-09-01 | — | — | US | claimed |
| US-20060249482-A1 | Chemical mechanical polishing compositions for step-ll copper line and other associated materials and method of using same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2006-11-09 | — | — | US | claimed |
| US-20040108302-A1 | Passivative chemical mechanical polishing composition for copper film planarization | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2004-06-10 | — | — | US | claimed |
| US-5817610-A | Non-corrosive cleaning composition for removing plasma etching residues | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1998-10-06 | — | — | US | claimed |
| US-5780406-A | MIXTURE OF HYDROXYLAMMONIUM SALT AND AMINE AND/OR QUATERNARY AMMONIUM HYDROXIDE; SEMICONDUCTORS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 1998-07-14 | — | — | US | claimed |
| US-12276915-B2 | Treatment liquid and treatment method | FUJIFILM CORPORATION (JP) | 2025-04-15 | — | — | US | disclosed |
| CN-118001774-A | Method for coproducing alkane by preprocessing straws with ionic liquid | 河南农业大学 | 2024-05-10 | — | — | CN | disclosed |
| CN-116713032-A | Method for preparing methylation reaction catalyst and tetramethyl ammonium methyl carbonate | 万华化学集团股份有限公司 | 2023-09-08 | — | — | CN | disclosed |
| CN-114367286-B | Metal monoatomic catalyst and preparation method thereof | 中国科学院地球环境研究所 | 2023-05-26 | — | — | CN | disclosed |
| CN-113198422-B | Amino-functionalized halloysite porous microsphere-based gas adsorption material, and preparation method and application thereof | 长安大学 | 2023-04-07 | — | — | CN | disclosed |
| CN-114367286-A | Metal monatomic catalyst and preparation method thereof | 中国科学院地球环境研究所 | 2022-04-19 | — | — | CN | disclosed |
| CN-113198422-A | Amino-functionalized halloysite porous microsphere-based gas adsorption material, and preparation method and application thereof | 长安大学 | 2021-08-03 | — | — | CN | disclosed |
| EP-0944708-B1 | NON-CORROSIVE CLEANING COMPOSITION FOR REMOVING PLASMA ETCHING RESIDUES | ARCH SPEC CHEM INC (US) | 2003-01-02 | — | — | EP | disclosed |
| EP-1211564-A2 | Non-corrosive cleaning composition for removing plasma etching residues | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-06-05 | — | — | EP | disclosed |
| EP-0829768-B1 | Non-corrosive cleaning composition for removing plasma etching residues | ARCH SPEC CHEM INC (US) | 2002-03-06 | — | — | EP | disclosed |
| US-6020292-A | Non-corrosive cleaning composition for removing plasma etching residues | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 2000-02-01 | — | — | US | disclosed |
| US-5817610-A | Non-corrosive cleaning composition for removing plasma etching residues | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1998-10-06 | — | — | US | disclosed |
| US-5780406-A | MIXTURE OF HYDROXYLAMMONIUM SALT AND AMINE AND/OR QUATERNARY AMMONIUM HYDROXIDE; SEMICONDUCTORS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 1998-07-14 | — | — | US | disclosed |
| EP-0829768-A1 | Non-corrosive cleaning composition for removing plasma etching residues | Olin Microelectronic Chemicals, Inc. (US) | 1998-03-18 | — | — | EP | disclosed |
| US-4977109-A | HEATING NITRATES TO GENERATE NITROGEN OXIDES,CALCINING | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 1990-12-11 | — | — | US | disclosed |