Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | LTA4H | P09960 | 1/20 | 0.31 |
| ▸ | CES2 | O00748 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13879345 | 0.88 | ALDH1A1 (0.48) | ALDH1A1TDP1CYP2C19CA2ACHE | |
| SCHEMBL1667685 | 0.83 | CES2 (0.39) | LTA4HCES2 | |
| SCHEMBL15146907 | 0.79 | TDP1 (0.41) | TDP1LTA4HCES2 | |
| SCHEMBL11918238 | 0.78 | ALDH1A1 (0.45) | ALDH1A1TDP1ACHELTA4HCES2 | |
| SCHEMBL30851476 | 0.77 | ALDH1A1 (0.39) | ALDH1A1TDP1CYP2C19CA2ACHE | |
| SCHEMBL17992598 | 0.77 | CES2 (0.44) | LTA4HCES2 | |
| SCHEMBL109110 | 0.77 | — | — | |
| SCHEMBL22644547 | 0.76 | LTA4H (0.32) | LTA4HCES2 | |
| SCHEMBL2527131 | 0.76 | ALDH1A1 (0.42) | ALDH1A1TDP1CYP2C19CA2ACHE | |
| SCHEMBL9817218 | 0.76 | ALDH1A1 (0.55) | ALDH1A1TDP1CYP2C19CA2ACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2012026621-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | WO | disclosed |
| WO-2011118853-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-09-29 | — | — | WO | disclosed |