SCHEMBL724164

SCHEMBL724164

[SiH3]C(=C(c1ccccc1)c1ccccc1)c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 3/20 0.41
CES2 O00748 2/20 0.41
TSHR P16473 2/20 0.41
DAO P14920 1/20 0.41
NAPRT Q6XQN6 1/20 0.41
ALDH1A1 P00352 1/20 0.41
ESR1 P03372 2/20 0.39
F2 P00734 2/20 0.38
CYP3A4 P08684 2/20 0.38
MAPT P10636 2/20 0.38
BLM P54132 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
CA2 P00918 2/20 0.38
CA4 P22748 2/20 0.38
F10 P00742 1/20 0.38
F12 P00748 1/20 0.38
F7 P08709 1/20 0.38
F3 P13726 1/20 0.38
PKM P14618 1/20 0.38
POLB P06746 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23413235 0.79 ESR1 (0.41) CES1CES2ESR1CYP3A4PTGS2
Benzene SCHEMBL28326432 0.77 CES1 (0.53) CES1CES2TSHRDAONAPRT
SCHEMBL67982 0.77 CES1 (0.53) CES1CES2TSHRDAONAPRT
SCHEMBL23413234 0.75 PTGS2 (0.35) CES1CES2ESR1PTGS2CYP19A1
SCHEMBL15302826 0.74 CES1 (0.39) CES1CES2TSHRDAONAPRT
SCHEMBL1062320 0.74 CES1 (0.39) CES1CES2TSHRDAONAPRT
SCHEMBL2270825 0.74 CES2 (0.39) CES1CES2TSHRDAONAPRT
SCHEMBL15302073 0.74 CES1 (0.39) CES1CES2TSHRDAONAPRT
SCHEMBL5831030 0.74 CES2 (0.44) CES1CES2TSHRDAONAPRT
SCHEMBL9580190 0.74 CES1 (0.50) CES1CES2TSHRDAONAPRT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 269 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3927782-B1 AN ANTI-RUST COMPOSITION FOR METAL SURFACE AND A METHOD OF ANTI-RUST TREATMENT ON METAL SURFACE CHEMETALL GMBH (DE) 2026-04-08 EP claimed
EP-3521366-B1 CURABLE MODIFIED PETROLEUM RESIN, AND PREPARATION METHOD AND USE THEREOF KOLON INC (KR) 2025-07-30 EP claimed
EP-3647333-B1 CURABLE PETROLEUM RESIN, PREPARATION METHOD THEREFOR, AND USE THEREOF KOLON INC (KR) 2025-06-18 EP claimed
US-20250011621-A1 COMPOSITE COATING, PREPARATION METHOD, AND DEVICE JIANGSU FAVORED NANOTECHNOLOGY CO., LTD. (CN) 2025-01-09 US claimed
EP-4421137-A1 COMPOSITE COATING, PREPARATION METHOD, AND DEVICE Jiangsu Favored Nanotechnology Co., Ltd. (CN) 2024-08-28 EP claimed
US-12006445-B2 Anti-rust composition for metal surface and a method of anti-rust treatment on metal surface CHEMETALL GMBH (DE) 2024-06-11 US claimed
EP-4350031-A1 PLASMA POLYMERISATION COATING, PREPARATION METHOD, AND DEVICE Jiangsu Favored Nanotechnology Co., Ltd. (CN) 2024-04-10 EP claimed
CN-117801530-A High-crosslinking weather-resistant organic silicon gel and preparation method thereof 贵州蒙江流域开发有限公司 2024-04-02 CN claimed
CN-115991951-B Composite coating, preparation method and device 江苏菲沃泰纳米科技股份有限公司 2024-02-20 CN claimed
US-11655398-B2 Curable petroleum resin, preparation method therefor, and use thereof KOLON INDUSTRIES, INC. (KR) 2023-05-23 US claimed
EP-0067066-B2 Dry-developing resist composition FUJITSU LTD (JP) 1994-01-12 EP claimed
EP-0415073-A2 Substantially transparent flame retardant aromatic polycarbonate compositions GENERAL ELECTRIC COMPANY (US) 1991-03-06 EP claimed
US-4954549-A Substantially transparent flame retardant aromatic polycarbonate compositions GENERAL ELECTRIC COMPANY (US) 1990-09-04 US claimed
US-4756989-A Aluminum or silicon substrate, copolymer resist layer comprising vinyl aromatic, ethylenically unsaturated units ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1988-07-12 US claimed
EP-0067066-B1 DRY-DEVELOPING RESIST COMPOSITION FUJITSU LIMITED (JP) 1985-12-18 EP claimed
EP-0067067-B1 DRY-DEVELOPING NEGATIVE RESIST COMPOSITION FUJITSU LIMITED (JP) 1985-09-25 EP claimed
US-4481279-A Dry-developing resist composition FUJITSU LIMITED (JP) 1984-11-06 US claimed
US-4464455-A Dry-developing negative resist composition FUJITSU LIMITED (JP) 1984-08-07 US claimed
EP-0067066-A2 Dry-developing resist composition FUJITSU LIMITED (JP) 1982-12-15 EP claimed
EP-0067067-A2 Dry-developing negative resist composition FUJITSU LIMITED (JP) 1982-12-15 EP claimed