SCHEMBL7248686

SCHEMBL7248686

[2H]C([2H])=C(C(=O)OC([2H])([2H])C([2H])([2H])C([2H])([2H])[Si](OC([2H])([2H])[2H])(OC([2H])([2H])[2H])OC([2H])([2H])[2H])C([2H])([2H])[2H]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7243069 0.82
SCHEMBL7246891 0.68 TSHR (0.49)
SCHEMBL7242197 0.65
SCHEMBL6536991 0.63 HTT (0.39)
SCHEMBL1332425 0.61
SCHEMBL5338408 0.61 THRB (0.41)
SCHEMBL16516371 0.60 TSHR (0.43)
Methacrylic Acid SCHEMBL18911579 0.58 ALDH1A1 (0.33)
SCHEMBL9641328 0.55
SCHEMBL9642204 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6632585-B1 Copolymer of partially deuterated and/or halogenated vinyl siloxanes; heat, water and chemical resistance; high transmission at communication wavelength ranges NIPPON SHEET GLASS CO., LTD. (JP) 2003-10-14 US disclosed
EP-1154323-A1 PHOTOSENSITIVE COMPOSITION, AND OPTICAL WAVEGUIDE ELEMENT AND PROCESS FOR PRODUCING THE SAME Nippon Sheet Glass Co., Ltd. (JP) 2001-11-14 EP disclosed