SCHEMBL7249591

SCHEMBL7249591

O/N=C(/c1ccc(Oc2ccccc2)cc1)C(F)(F)F

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.50
ALDH1A1 P00352 1/20 0.50
ALOX15 P16050 1/20 0.50
HSD17B10 Q99714 1/20 0.50
PARP10 Q53GL7 1/20 0.46
SRD5A2 P31213 4/20 0.44
LTA4H P09960 4/20 0.44
NR1H2 P55055 1/20 0.44
BAX Q07812 1/20 0.44
TSHR P16473 1/20 0.43
MAPK14 Q16539 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC2 Q92769 1/20 0.41
ERCC5 P28715 1/20 0.40
FEN1 P39748 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
MAOA P21397 1/20 0.39
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7249593 1.00 GAA (0.50) GAAALDH1A1ALOX15HSD17B10PARP10
SCHEMBL30219465 0.85 PKM (0.53) GAAALDH1A1ALOX15HSD17B10PARP10
SCHEMBL9799638 0.82 ALDH1A1 (0.57) GAAALDH1A1ALOX15HSD17B10TSHR
SCHEMBL1669122 0.82 ALDH1A1 (0.57) GAAALDH1A1ALOX15HSD17B10TSHR
SCHEMBL7246133 0.82 ALDH1A1 (0.57) GAAALDH1A1ALOX15HSD17B10TSHR
SCHEMBL30219433 0.79 NR4A2 (0.55) GAAPARP10SRD5A2MAOA
SCHEMBL9799525 0.78 ALDH1A1 (0.53) GAAALDH1A1ALOX15HSD17B10
SCHEMBL4665190 0.78 ALDH1A1 (0.58) GAAALDH1A1ALOX15HSD17B10PARP10
SCHEMBL4665191 0.78 ALDH1A1 (0.58) GAAALDH1A1ALOX15HSD17B10PARP10
SCHEMBL9799529 0.78 ALDH1A1 (0.53) GAAALDH1A1ALOX15HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6512020-B1 Photosensitive acid-donors in chemically amplified resist formulations. activated by irradiation with actinic electromagnetic radiation and electron beams. CIBA SPECIALTY CHEMICALS CORPORATION 2003-01-28 US disclosed
US-6261738-B1 LATENT CURING CATALYSTS FOR PHOTORESISTS SUCH AS 2,2,2-TRIFLUORO-1-PHENYL-ETHANONE OXIME-O-METHYL SULFONATE CIBA SPECIALTY CHEMICALS CORPORATION 2001-07-17 US disclosed