Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSK | P43235 | 7/20 | 0.42 |
| ▸ | CTSL | P07711 | 5/20 | 0.42 |
| ▸ | CTSB | P07858 | 4/20 | 0.42 |
| ▸ | CTSS | P25774 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | ADRB2 | P07550 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | ELANE | P08246 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7252956 | 0.89 | CTSK (0.37) | CTSKCTSLCTSBCTSS | |
| SCHEMBL2773963 | 0.87 | MAPT (0.35) | CTSKCTSLCTSBMEN1KMT2A | |
| SCHEMBL15188009 | 0.87 | CTSK (0.48) | CTSKCTSLCTSBCTSSALDH1A1 | |
| SCHEMBL7269137 | 0.86 | LMNA (0.34) | CTSKCTSLCTSBMEN1KMT2A | |
| Styrene SCHEMBL6858832 | 0.85 | MEN1 (0.32) | CTSKCTSLCTSBMEN1KMT2A | |
| SCHEMBL2776503 | 0.80 | — | — | |
| SCHEMBL7251880 | 0.79 | KDM4E (0.30) | — | |
| SCHEMBL6858336 | 0.79 | — | — | |
| SCHEMBL28601849 | 0.78 | CNR1 (0.36) | MEN1KMT2ALMNAMAPT | |
| SCHEMBL6859864 | 0.77 | KMT2A (0.35) | CTSLCTSBMEN1KMT2ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6641975-B2 | Ternary copolymer of hydroxystyrene, tertiary alkyl (meth)acrylate and substitutable phenoxyalkyl (meth)acrylate; enhanced contrast of alkali dissolution rate before and after exposure, high sensitivity, high resolution | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-04 | — | — | US | disclosed |
| US-20020039701-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-04 | — | — | US | disclosed |