SCHEMBL7258256

SCHEMBL7258256

C[Si](C)(C)[Si](OC1=CCCCC1)([Si](C)(C)C)[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL817040 0.83 ALDH1A1 (0.33)
SCHEMBL3456698 0.83
SCHEMBL28488936 0.81 ALDH1A1 (0.32)
SCHEMBL2386422 0.81 ALDH1A1 (0.32)
SCHEMBL2386417 0.81 ALDH1A1 (0.32)
SCHEMBL10978153 0.78 ALDH1A1 (0.30)
SCHEMBL4883799 0.76 PREP (0.30)
SCHEMBL2728626 0.76 P2RX7 (0.32)
SCHEMBL29040729 0.76 P2RX7 (0.32)
SCHEMBL10981001 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6641971-B2 Polymer having one or more polar functional groups, wherein at least one of the functional groups is protected with a silyl ketal group; an acid generator; and a solvent INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-11-04 US claimed
US-20020197556-A1 Resist compositions comprising silyl ketals and methods of use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-12-26 US claimed
US-6641971-B2 Polymer having one or more polar functional groups, wherein at least one of the functional groups is protected with a silyl ketal group; an acid generator; and a solvent INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-11-04 US disclosed
US-20020197556-A1 Resist compositions comprising silyl ketals and methods of use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-12-26 US disclosed