SCHEMBL7260994

SCHEMBL7260994

O=C(CCC(c1ccccc1)c1ccc(C(=O)Oc2ccccc2)cc1)Oc1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PARP10 Q53GL7 1/20 0.46
TMPRSS15 P98073 2/20 0.46
PRSS1 P07477 2/20 0.46
ACR P10323 1/20 0.46
MAPT P10636 6/20 0.43
KMT2A Q03164 5/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
NSD2 O96028 1/20 0.43
MEN1 O00255 3/20 0.42
ALDH1A1 P00352 5/20 0.41
GAA P10253 1/20 0.41
TDP1 Q9NUW8 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
PKM P14618 1/20 0.41
ELANE P08246 1/20 0.41
PRSS2 P07478 1/20 0.40
PRSS3 P35030 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27484392 0.89 ALDH1A1 (0.48) PRSS1MAPTKMT2AALDH1A1L3MBTL1
SCHEMBL11815316 0.88 ALDH1A1 (0.47) PRSS1MAPTKMT2AALDH1A1L3MBTL1
SCHEMBL2987920 0.83 PRSS1 (0.51) PRSS1MAPTKMT2AMEN1ALDH1A1
SCHEMBL7871803 0.77 ALDH1A1 (0.48) MAPTKMT2ASMN1; SMN2ALDH1A1ELANE
SCHEMBL70034 0.77 PARP10 (0.70) PARP10TMPRSS15PRSS1ACRMAPT
SCHEMBL8422497 0.74 PRSS1 (0.61) PARP10TMPRSS15PRSS1ACRMAPT
SCHEMBL28278496 0.73 LMNA (0.46) MAPTKMT2ASMN1; SMN2ALDH1A1TDP1
SCHEMBL8205435 0.73 PARP10 (0.78) PARP10TMPRSS15PRSS1ACRMAPT
SCHEMBL43742 0.73 KMT2A (0.61) PRSS1MAPTKMT2ASMN1; SMN2ALDH1A1
SCHEMBL31888 0.73 PARP10 (0.70) PARP10TMPRSS15PRSS1ACRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6642393-B2 Such as 2,5-(dihydroxybenzenecarboxylic octane)-dibenzoate-3,3',4,4' -tetracarboxylic acid anhydride for producing polyimides or polyamic acides having low water absorption; for use in cosmetics, aeronautics, and electronics KANEKA CORPORATION (JP) 2003-11-04 US disclosed
US-20020055610-A1 Novel polyimide compositions and novel acid dianhydrides to be used therein KANEKA CORPORATION (JP) 2002-05-09 US disclosed