Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | GSK3B | P49841 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.41 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.41 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.41 |
| ▸ | GPR139 | Q6DWJ6 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 4/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8309337 | 0.84 | NR4A2 (0.52) | KMT2AALDH1A1GSK3BMAPK1HIF1A | |
| SCHEMBL16047247 | 0.83 | KMT2A (0.52) | KMT2AALDH1A1GSK3BMAPK1TRPA1 | |
| SCHEMBL18244312 | 0.82 | MAPT (0.55) | KMT2AALDH1A1GSK3BMAPK1TRPA1 | |
| SCHEMBL11001103 | 0.81 | GSK3B (0.44) | KMT2AALDH1A1GSK3BMAPTL3MBTL1 | |
| SCHEMBL12154245 | 0.81 | KMT2A (0.48) | KMT2AALDH1A1GSK3BMAPK1PTPN1 | |
| SCHEMBL6057430 | 0.80 | ALDH1A1 (0.48) | KMT2AALDH1A1GSK3BMAPK1TRPA1 | |
| SCHEMBL8131829 | 0.80 | KMT2A (0.54) | KMT2AALDH1A1GSK3BMAPK1TRPA1 | |
| SCHEMBL7909243 | 0.79 | KMT2A (0.49) | KMT2AALDH1A1GSK3BMAPK1TRPA1 | |
| SCHEMBL31131464 | 0.79 | KMT2A (0.49) | KMT2AALDH1A1GSK3BMAPK1TRPA1 | |
| SCHEMBL18243769 | 0.78 | KMT2A (0.46) | KMT2AALDH1A1GSK3BPTPN1GPR139 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8241829-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2012-08-14 | — | — | US | disclosed |
| US-8241829-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2012-08-14 | — | — | US | disclosed |
| US-8049042-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-8049042-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20110144295-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20110144295-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| US-4457935-A | ANGIOTENSIN-CONVERTING ENZYME INHIBITOR | SANTEN PHARMACEUTICAL CO., LTD. (JP) | 1984-07-03 | — | — | US | disclosed |
| US-4442038-A | Converting enzyme inhibitors | NORWICH EATON PHARMACEUTICALS, INC. | 1984-04-10 | — | — | US | disclosed |
| EP-0103927-A1 | Converting enzyme inhibitors | Norwich Eaton Pharmaceuticals, Inc. (US) | 1984-03-28 | — | — | EP | disclosed |
| US-4430344-A | Antihypertensive 4-thiazolidinecarboxylic acids | SANTEN PHARMACEUTICAL CO., LTD. (JP) | 1984-02-07 | — | — | US | disclosed |
| US-4423054-A | Antihypertensive 4-thiazolidinecarboxylic acids (substituted alkyl derivatives) | SANTEN PHARMACEUTICAL CO., LTD. (JP) | 1983-12-27 | — | — | US | disclosed |
| EP-0012845-B1 | TETRAHYDROISOQUINOLINE COMPOUNDS, PROCESS FOR PREPARING SAME AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | Tanabe Seiyaku Co., Ltd. (JP) | 1983-06-22 | — | — | EP | disclosed |
| US-4386096-A | ANGIOTENSIN-CONVERTING ENZYME INHIBITORS | SANTEN PHARMACEUTICAL CO., LTD. (JP) | 1983-05-31 | — | — | US | disclosed |
| US-4356183-A | ENZYME INHIBITORS | SANTEN PHARMACEUTICAL CO., LTD. (JP) | 1982-10-26 | — | — | US | disclosed |
| US-4264620-A | HYPOTENSIVE AGENTS | SANTEN PHARMACEUTICAL CO., LTD. (JP) | 1981-04-28 | — | — | US | disclosed |
| EP-0012845-A1 | Tetrahydroisoquinoline compounds, process for preparing same and pharmaceutical compositions containing them | Tanabe Seiyaku Co., Ltd. (JP) | 1980-07-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | CHRM1, CHRM2, PKN2 | KMT2A 905/4885ALDH1A1 3349/4885GSK3B 2598/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.