Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR4A2 | P43354 | 1/20 | 0.52 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.47 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.47 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.47 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.47 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.47 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.47 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.47 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.47 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.47 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.47 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.43 |
| ▸ | GSK3B | P49841 | 1/20 | 0.43 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.43 |
| ▸ | GPR139 | Q6DWJ6 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8308737 | 0.88 | ALDH1A1 (0.56) | NR4A2CYP2C19ALDH1A1GAAHDAC3 | |
| SCHEMBL16047247 | 0.87 | KMT2A (0.52) | CYP2C19ALDH1A1GAAKMT2APTPN1 | |
| SCHEMBL18244312 | 0.86 | MAPT (0.55) | NR4A2CYP2C19ALDH1A1GAAHDAC3 | |
| SCHEMBL12154245 | 0.84 | KMT2A (0.48) | NR4A2ALDH1A1KMT2APTPN1GSK3B | |
| SCHEMBL7290449 | 0.84 | KMT2A (0.45) | NR4A2CYP2C19ALDH1A1KMT2APTPN1 | |
| SCHEMBL7909243 | 0.83 | KMT2A (0.49) | CYP2C19ALDH1A1KMT2APTPN1GSK3B | |
| SCHEMBL31131464 | 0.83 | KMT2A (0.49) | CYP2C19ALDH1A1HDAC3HDAC4HDAC1 | |
| SCHEMBL8308131 | 0.82 | TSHR (0.57) | ALDH1A1KMT2APTPN1TSHRL3MBTL1 | |
| SCHEMBL18243769 | 0.81 | KMT2A (0.46) | CYP2C19ALDH1A1GAAHDAC3HDAC4 | |
| SCHEMBL10952894 | 0.81 | GSK3B (0.50) | CYP2C19ALDH1A1GAAKMT2APTPN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-55118456-A | — | — | None | — | — | JP | disclosed |
| US-8241829-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2012-08-14 | — | — | US | disclosed |
| US-8241829-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2012-08-14 | — | — | US | disclosed |
| US-8049042-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-8049042-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20110144295-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20110144295-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| EP-0903346-A1 | SYDNONE IMINE DERIVATIVES | Chugai Seiyaku Kabushiki Kaisha (JP) | 1999-03-24 | — | — | EP | disclosed |
| US-5330737-A | Nitrogen-sulfur ligands as opiate receptor drug mimics | MALLINCKRODT MEDICAL, INC. (US) | 1994-07-19 | — | — | US | disclosed |
| US-4461896-A | 1-[Acylthio) and (mercapto)-1-oxoalkyl]-1,2,3,4-tetrahydroquinoline-2-carboxylic acids | NORWICH EATON PHARMACEUTICALS, INC. (US) | 1984-07-24 | — | — | US | disclosed |
| US-4460601-A | Dipeptides having a methionine residue and possessing a protective action for the liver | MAGGIONI FARMACEUTICI, S.P.A. (IT) | 1984-07-17 | — | — | US | disclosed |
| EP-0012845-B1 | TETRAHYDROISOQUINOLINE COMPOUNDS, PROCESS FOR PREPARING SAME AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | Tanabe Seiyaku Co., Ltd. (JP) | 1983-06-22 | — | — | EP | disclosed |
| US-4256751-A | HYPOTENSIVE AGENTS | TANABE SEIYAKU CO., LTD. (JP) | 1981-03-17 | — | — | US | disclosed |
| JP-S55118456-A | METHOD OF COLLECTING OPTICALLY ACTIVE D-ALPHA-METHYL-BETA- BENZOYL-THIOPROPIONIC ACID | SUMITOMO CHEM CO LTD | 1980-09-11 | — | — | JP | disclosed |
| EP-0012845-A1 | Tetrahydroisoquinoline compounds, process for preparing same and pharmaceutical compositions containing them | Tanabe Seiyaku Co., Ltd. (JP) | 1980-07-09 | — | — | EP | disclosed |
| US-4186268-A | Mercaptoacylpyrrolidine phosphonic acids and related compounds | E. R. SQUIBB & SONS, INC. (US) | 1980-01-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | CHRM1, CHRM2, PKN2 | NR4A2 986/4885CYP2C19 2460/4885ALDH1A1 3349/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.