SCHEMBL730131

SCHEMBL730131

CC(=O)O[Si](C)(C)OC(C)=O.CO[Si](C)(C)OC

nearest known ligand 0.40

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.40
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3363301 0.92
SCHEMBL74717 0.88 ALDH1A1 (0.41) ALDH1A1TSHR
SCHEMBL22711080 0.85 ALDH1A1 (0.39) ALDH1A1TSHR
SCHEMBL8853367 0.80 ALDH1A1 (0.35) ALDH1A1TSHR
SCHEMBL1051766 0.78 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL130980 0.77 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL338658 0.76
SCHEMBL10795711 0.74 ALDH1A1 (0.35) ALDH1A1TSHR
SCHEMBL1638894 0.74 ALDH1A1 (0.35) ALDH1A1TSHR
SCHEMBL838347 0.74 ALDH1A1 (0.42) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1482070-B1 MECHANICAL ENHANCER ADDITIVES FOR LOW DIELECTRIC FILMS AIR PROD & CHEM (US) 2015-11-11 EP claimed
US-8137764-B2 organosilicate film formed by plasma-enhanced chemical vapor deposition from a first silicon-containing precursor that comprises from 3 to 4 Si O bonds per Si atom, from 0 to 1 of Si H, Si Br, and Si Cl bonds per Si atom and a second silicon-containing precursor comprises at least one Si C bond per Si AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-03-20 US claimed
US-20040241463-A1 Mechanical enhancer additives for low dielectric films VERSUM MATERIALS US, LLC 2004-12-02 US claimed
EP-1482070-A1 Mechanical enhancer additives for low dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-12-01 EP claimed
US-11164739-B2 Use of silicon structure former with organic substituted hardening additive compounds for dense OSG films VERSUM MATERIALS US, LLC (US) 2021-11-02 US disclosed
US-20190244810-A1 Use of Silicon Structure Former with Organic Substituted Hardening Additive Compounds for Dense OSG Films VERSUM MATERIALS US, LLC (US) 2019-08-08 US disclosed
EP-1482070-B1 MECHANICAL ENHANCER ADDITIVES FOR LOW DIELECTRIC FILMS AIR PROD & CHEM (US) 2015-11-11 EP disclosed
US-8137764-B2 organosilicate film formed by plasma-enhanced chemical vapor deposition from a first silicon-containing precursor that comprises from 3 to 4 Si O bonds per Si atom, from 0 to 1 of Si H, Si Br, and Si Cl bonds per Si atom and a second silicon-containing precursor comprises at least one Si C bond per Si AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-03-20 US disclosed
EP-2261390-A2 Mechanical enhancer additives for low dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-12-15 EP disclosed
US-20040241463-A1 Mechanical enhancer additives for low dielectric films VERSUM MATERIALS US, LLC 2004-12-02 US disclosed
EP-1482070-A1 Mechanical enhancer additives for low dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-12-01 EP disclosed