SCHEMBL733860

SCHEMBL733860

C=CC(=O)OCC[SiH2]C(OC)OC

nearest known ligand 0.47

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.47
HPGD P15428 1/20 0.47
ALDH1A1 P00352 4/20 0.47
TP53 P04637 3/20 0.47
HIF1A Q16665 3/20 0.47
CYP3A4 P08684 2/20 0.47
HSD17B10 Q99714 1/20 0.47
THRB P10828 2/20 0.40
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL140890 0.90 TSHR (0.53) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL16538074 0.88 TSHR (0.56) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL21101830 0.87 TSHR (0.59) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL16537404 0.87 TSHR (0.59) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL29402140 0.87 TSHR (0.59) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL26918864 0.87 TSHR (0.59) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL397194 0.83 TSHR (0.44) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL16536943 0.83 TSHR (0.49) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL3915993 0.81 TSHR (0.47) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL8461574 0.81 ATM (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250011596-A1 SILICONE CORE ACRYLIC SHELL IMPACT MODIFIERS CONTAINING PHOSPHORUS ROHM & HAAS (US) 2025-01-09 US disclosed
EP-4444774-A1 SILICONE CORE ACRYLIC SHELL IMPACT MODIFIERS CONTAINING PHOSPHORUS Rohm and Haas Company (US) 2024-10-16 EP disclosed
WO-2023107523-A1 SILICONE CORE ACRYLIC SHELL IMPACT MODIFIERS CONTAINING PHOSPHORUS ROHM AND HAAS COMPANY (US) 2023-06-15 WO disclosed
CN-111533854-B Silicon modified acrylic resin and application thereof 上海亿祺化工技术有限公司 2023-03-31 CN disclosed
CN-108300385-B Adhesive sheet, display, and method for producing same 琳得科株式会社 2022-02-15 CN disclosed
CN-111533854-A Silicon modified acrylic resin and application thereof 上海亿祺化工技术有限公司 2020-08-14 CN disclosed
US-10682669-B2 Method for manufacturing laminate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-16 US disclosed
EP-3045506-B1 ACTINIC ENERGY RADIATION-CURABLE ACRYLIC SILICONE RESIN COMPOSITION AND COATED ARTICLE SHINETSU CHEMICAL CO (JP) 2020-03-04 EP disclosed
US-20190291394-A1 LAMINATED BODY AND PRODUCTION METHOD THEREFOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-09-26 US disclosed
EP-3527366-A1 LAMINATED BODY AND PRODUCTION METHOD THEREFOR Shin-Etsu Chemical Co., Ltd. (JP) 2019-08-21 EP disclosed
US-20100273019-A1 MULTILAYER STRUCTURE POLYMER AND RESIN COMPOSITION TOGETHER WITH ACRYLIC RESIN FILM MATERIAL, ACRYLIC RESIN LAMINATE FILM, PHOTOCURABLE ACRYLIC RESIN FILM OR SHEET, LAMINATE FILM OR SHEET AND LAMINATE MOLDING OBTAINED BY LAMINATING THEREOF MITSUBISHI RAYON CO., LTD. (JP) 2010-10-28 US disclosed
EP-1582538-B1 MULTILAYER STRUCTURE POLYMER AND RESIN COMPOSITION TOGETHER WITH ACRYLIC RESIN FILM MATERIAL, ACRYLIC RESIN LAMINATE FILM, PHOTOCURABLE ACRYLIC RESIN FILM OR SHEET, LAMINATE FILM OR SHEET AND LAMINATE MOLDING OBTAINED BY LAMINATING THEREOF MITSUBISHI RAYON CO (JP) 2010-05-05 EP disclosed
EP-1582538-A1 MULTILAYER STRUCTURE POLYMER AND RESIN COMPOSITION TOGETHER WITH ACRYLIC RESIN FILM MATERIAL, ACRYLIC RESIN LAMINATE FILM, PHOTOCURABLE ACRYLIC RESIN FILM OR SHEET, LAMINATE FILM OR SHEET AND LAMINATE MOLDING OBTAINED BY LAMINATING THEREOF Mitsubishi Rayon Co., Ltd. (JP) 2005-10-05 EP disclosed
EP-1170109-B1 Photocuring resin compositions, photocuring sheets using the same, production thereof and process of production of a molded article using the same sheets MITSUBISHI RAYON CO (JP) 2005-03-30 EP disclosed
US-6646022-B2 Thermoplastic resin having a radical polymerizing unsaturated group at its side chain and a photopolymerization initiator and not comprising an additional crosslinking compound MITSUBISHI RAYON CO., LTD. (JP) 2003-11-11 US disclosed
US-20020032250-A1 Photocuring resin compositions, photocuring sheets and molded article using the same, and processes of production thereof MITSUBISHI RAYON CO., LTD. (JP) 2002-03-14 US disclosed
EP-1170109-A1 Photocuring resin compositions, photocuring sheets and molded article using the same and processes of production thereof Mitsubishi Rayon Co., Ltd. (JP) 2002-01-09 EP disclosed
EP-0534753-B1 Composite composition having high transparency and process for producing same MITSUBISHI RAYON CO (JP) 1996-12-18 EP disclosed
US-5385988-A A curable blends consisting of an additional polymer and a polysilicates, polysiloxanes or polysilsesquioxanes in a dispersion system of colloidal silica to form rigid, tough interpenetrating polymer networks MITSUBISHI RAYON CO., LTD. (JP) 1995-01-31 US disclosed
EP-0534753-A1 Composite composition having high transparency and process for producing same MITSUBISHI RAYON CO., LTD. (JP) 1993-03-31 EP disclosed