SCHEMBL735164

SCHEMBL735164

Cc1ccccc1-c1cccc(C(=O)OOC(=O)c2cccc(-c3ccccc3C)c2)c1

nearest known ligand 0.55

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NR1H4 Q96RI1 3/20 0.55
FFAR1 O14842 3/20 0.50
SMYD2 Q9NRG4 1/20 0.47
F2 P00734 1/20 0.47
LMNA P02545 1/20 0.47
S1PR4 O95977 1/20 0.47
MCL1 Q07820 1/20 0.46
CNR1 P21554 1/20 0.46
HTR7 P34969 1/20 0.44
AKR1C3 P42330 1/20 0.43
AKR1C2 P52895 1/20 0.43
FFAR4 Q5NUL3 1/20 0.43
GRIN2B Q13224 1/20 0.43
CDK4 P11802 1/20 0.43
CCND1 P24385 1/20 0.43
MAPT P10636 1/20 0.42
TDP1 Q9NUW8 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30052167 0.89 NR1H4 (0.53) NR1H4FFAR1SMYD2S1PR4MCL1
SCHEMBL7830361 0.89 NR1H4 (0.57) NR1H4FFAR1SMYD2S1PR4CNR1
SCHEMBL3947571 0.86 POLB (0.54) NR1H4FFAR1MAPT
SCHEMBL2995452 0.83 NR1H4 (0.74) NR1H4FFAR1SMYD2S1PR4MCL1
SCHEMBL17629357 0.82 LMNA (0.58) NR1H4FFAR1LMNATDP1
SCHEMBL3636122 0.81 NR1H4 (0.56) NR1H4FFAR1SMYD2S1PR4MCL1
SCHEMBL27959627 0.81 NR1H4 (0.59) NR1H4FFAR1SMYD2S1PR4MCL1
SCHEMBL28452076 0.81 NR1H4 (0.59) NR1H4FFAR1SMYD2LMNAS1PR4
SCHEMBL14241162 0.79 NR1H4 (0.53) NR1H4FFAR1SMYD2S1PR4MCL1
SCHEMBL964598 0.79 NR1H4 (0.53) NR1H4FFAR1SMYD2S1PR4MCL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4258342-B1 TWO-COMPONENT CURABLE COMPOSITION AND CURED PRODUCT THEREOF COSMO OIL LUBRICANTS CO LTD (JP) 2026-04-01 EP disclosed
WO-2025028473-A1 THERMOSETTING COMPOSITION, METHOD FOR PRODUCING MOLDED ARTICLE USING SAME, AND CURED PRODUCT 出光興産株式会社 2025-02-06 WO disclosed
WO-2025028480-A1 THERMOSETTING COMPOSITION, METHOD FOR PRODUCING MOLDED ARTICLE USING SAME, AND CURED PRODUCT 出光興産株式会社 2025-02-06 WO disclosed
WO-2025028482-A1 THERMOSETTING COMPOSITION, METHOD FOR PRODUCING MOLDED ARTICLE USING SAME, AND CURED PRODUCT 出光興産株式会社 2025-02-06 WO disclosed
US-20240052077-A1 Two-Component Curable Composition and Cured Product Thereof COSMO OIL LUBRICANTS CO., LTD. (JP) 2024-02-15 US disclosed
WO-2023238253-A1 BUFFER SHEET, METHOD FOR MOUNTING ELECTRONIC COMPONENT, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT DEVICE 株式会社レゾナック 2023-12-14 WO disclosed
EP-4258342-A1 TWO-COMPONENT CURABLE COMPOSITION AND CURED PRODUCT THEREOF Cosmo Oil Lubricants Co., Ltd. (JP) 2023-10-11 EP disclosed
CN-111655662-B Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method 三菱瓦斯化学株式会社 2023-09-26 CN disclosed
WO-2023062671-A1 ELECTRONIC COMPONENT DEVICE MANUFACTURING METHOD, ELECTRONIC COMPONENT MOUNTING METHOD, AND BUFFER SHEET 株式会社レゾナック 2023-04-20 WO disclosed
WO-2023062670-A1 BUFFER SHEET, METHOD FOR MOUNTING ELECTRONIC COMPONENT, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT DEVICE 株式会社レゾナック 2023-04-20 WO disclosed
US-20170301950-A1 SOLID ELECTROLYTE COMPOSITION, ELECTRODE SHEET FOR BATTERY USING THE SAME, ALL SOLID STATE SECONDARY BATTERY, AND METHOD FOR MANUFACTURING ELECTRODE SHEET FOR BATTERY AND ALL SOLID STATE SECONDARY BATTERY FUJIFILM CORPORATION (JP) 2017-10-19 US disclosed
US-20170203476-A1 THERMOSETTING COMPOSITION, AND METHOD FOR MANUFACTURING THERMOSET RESIN IDEMITSU KOSAN CO., LTD. (JP) 2017-07-20 US disclosed
US-20160336613-A1 SOLID ELECTROLYTE COMPOSITION, ELECTRODE SHEET FOR BATTERY AND ALL-SOLID-STATE SECONDARY BATTERY IN WHICH SOLID ELECTROLYTE COMPOSITION IS USED, AND METHOD FOR MANUFACTURING ELECTRODE SHEET FOR BATTERY AND ALL-SOLID-STATE SECONDARY BATTERY FUJIFILM CORPORATION (JP) 2016-11-17 US disclosed
US-8138287-B2 (Meth)acrylate copolymer for syrup and resin composition thereof IDEMITSU KOSAN CO., LTD. (JP) 2012-03-20 US disclosed
US-20100234527-A1 OPTICAL SEMICONDUCTOR ENCAPSULATING MATERIAL IDEMITSU KOSAN CO., LTD. (JP) 2010-09-16 US disclosed
US-20100022733-A1 (METH)ACRYLATE COPOLYMER FOR SYRUP AND RESIN COMPOSITION THEREOF IDEMITSU KOSAN CO., LTD. (JP) 2010-01-28 US disclosed
US-20090268279-A1 REFLECTIVE MATERIAL AND REFLECTOR FOR LIGHT-EMITTING DIODE IDEMITSU KOSAN CO, LTD. (JP) 2009-10-29 US disclosed
EP-2088164-A1 (METH)ACRYLATE COPOLYMER FOR SYRUP AND RESIN COMPOSITION THEREOF Idemitsu Kosan Co., Ltd. (JP) 2009-08-12 EP disclosed
US-20040024152-A1 Gas hydrate formation inhibitor and method for inhibiting gas hydrate formation with the same MITSUBISHI RAYON CO., LTD. (JP) 2004-02-05 US disclosed
US-20030130454-A1 Process for producing amphipathic polymers MITSUBISHI RAYON CO., LTD. 2003-07-10 US disclosed