Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR3 | O14843 | 1/20 | 0.47 |
| ▸ | LCK | P06239 | 1/20 | 0.47 |
| ▸ | FYN | P06241 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.44 |
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.33 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.33 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 4/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | MGAM | O43451 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | SI | P14410 | 1/20 | 0.30 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.30 |
| ▸ | FGFR4 | P22455 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL6633787 | 1.00 | FFAR3 (0.47) | FFAR3LCKFYNALDH1A1LMNA | |
| Acetic Acid SCHEMBL6761218 | 1.00 | FFAR3 (0.47) | FFAR3LCKFYNALDH1A1LMNA | |
| Acetic Acid SCHEMBL6633487 | 1.00 | FFAR3 (0.47) | FFAR3LCKFYNALDH1A1LMNA | |
| Bicarbonate SCHEMBL28800487 | 0.90 | LMNA (0.41) | FFAR3LCKFYNALDH1A1LMNA | |
| Acetic Acid SCHEMBL30343482 | 0.89 | FFAR3 (0.58) | FFAR3LCKFYNALDH1A1LMNA | |
| Acetic Acid SCHEMBL14125983 | 0.89 | FFAR3 (0.58) | FFAR3LCKFYNALDH1A1LMNA | |
| Acetic Acid SCHEMBL28017923 | 0.89 | FFAR3 (0.58) | FFAR3LCKFYNALDH1A1LMNA | |
| Acetic Acid SCHEMBL896834 | 0.89 | — | — | |
| Acetic Acid SCHEMBL361746 | 0.89 | FFAR3 (0.58) | FFAR3LCKFYNALDH1A1LMNA | |
| Acetic Acid SCHEMBL6150066 | 0.86 | FFAR3 (0.54) | FFAR3LCKFYNALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117736612-A | Peelable quick-setting film and preparation method thereof | 广州市丰田通商汽车服务有限公司 | 2024-03-22 | — | — | CN | claimed |
| CN-113253572-B | Intelligent reversible photosensitive femtosecond laser photoresist and photoetching processing method | 之江实验室 | 2024-01-19 | — | — | CN | claimed |
| CN-113832748-B | Elastic printing paste containing single-component resin and application of elastic printing paste in sports wear | 广东榕树谷智能系统有限公司 | 2024-01-05 | — | — | CN | claimed |
| CN-115651517-B | Water-based single-component high-temperature cured elastic hand feeling coating and preparation method thereof | 邦弗特新材料股份有限公司 | 2023-10-27 | — | — | CN | claimed |
| CN-116836617-A | High-transparency matte varnish coating composition and preparation method and application thereof | 立邦涂料（中国）有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116445065-A | Chromium-free fingerprint-resistant coating liquid for galvanized steel sheet and preparation method thereof | 上海耀岩化学品有限公司 | 2023-07-18 | — | — | CN | claimed |
| EP-1825329-B1 | METHOD FOR FORMING ANTI-REFLECTIVE COATING | DOW CORNING (US) | 2015-04-08 | — | — | EP | claimed |
| US-8653217-B2 | Method for forming anti-reflective coating | DOW CORNING CORPORATION (US) | 2014-02-18 | — | — | US | claimed |
| US-8129491-B2 | Siloxane resin coating | DOW CORNING CORPORATION (US) | 2012-03-06 | — | — | US | claimed |
| EP-1664928-B1 | POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO LTD (JP) | 2012-02-29 | — | — | EP | claimed |
| US-20080014335-A1 | Method for Forming Anti-Reflective Coating | DOW SILICONES CORPORATION | 2008-01-17 | — | — | US | claimed |
| US-20070261600-A1 | Siloxane Resin Coating | DOW CORNING CORPORATION | 2007-11-15 | — | — | US | claimed |
| EP-1846479-A2 | SILOXANE RESIN COATING | Dow Corning Corporation (US) | 2007-10-24 | — | — | EP | claimed |
| EP-1825330-A1 | METHOD FOR FORMING ANTI-REFLECTIVE COATING | Dow Corning Corporation (US) | 2007-08-29 | — | — | EP | claimed |
| EP-1825329-A1 | METHOD FOR FORMING ANTI-REFLECTIVE COATING | Dow Corning Corporation (US) | 2007-08-29 | — | — | EP | claimed |
| EP-1819844-A1 | METHOD FOR FORMING ANTI-REFLECTIVE COATING | Dow Corning Corporation (US) | 2007-08-22 | — | — | EP | claimed |
| WO-2006065310-A2 | SILOXANE RESIN COATING | DOW CORNING CORPORATION (US) | 2006-06-22 | — | — | WO | claimed |
| WO-2006065320-A1 | METHOD FOR FORMING ANTI-REFLECTIVE COATING | DOW CORNING CORPORATION (US) | 2006-06-22 | — | — | WO | claimed |
| WO-2006065321-A1 | METHOD FOR FORMING ANTI-REFLECTIVE COATING | DOW CORNING CORPORATION (US) | 2006-06-22 | — | — | WO | claimed |
| WO-2006065316-A1 | METHOD FOR FORMING ANTI-REFLECTIVE COATING | DOW CORNING CORPORATION (US) | 2006-06-22 | — | — | WO | claimed |