SCHEMBL737022

SCHEMBL737022

CC(=O)O[SiH2]C1CCCC(C)(C)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17541903 0.63 MAPK1 (0.34)
SCHEMBL19747687 0.62 MAPK1 (0.31)
SCHEMBL10762962 0.62 TSHR (0.39)
SCHEMBL7257346 0.61 CYP1A2 (0.32)
SCHEMBL908733 0.60 PRKCA (0.42)
SCHEMBL11312481 0.59 L3MBTL1 (0.35)
SCHEMBL16877083 0.59
SCHEMBL18867848 0.59
SCHEMBL9692776 0.58 EP300 (0.32)
SCHEMBL21391147 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8138250-B2 Repulpable wax; overcoating cellulose with triglycerides; solidification H R D CORPORATION (US) 2012-03-20 US disclosed
EP-1687382-B1 NOVEL WAX FOR REDUCING MAR AND ABRASION IN INKS AND COATINGS HRD CORP (US) 2007-04-04 EP disclosed
EP-1687382-A2 NOVEL WAX FOR REDUCING MAR AND ABRASION IN INKS AND COATINGS HRD Corp (US) 2006-08-09 EP disclosed
US-20050131103-A1 Novel wax for reducing mar and abrasion in inks and coatings HRD CORP. 2005-06-16 US disclosed
WO-2005042655-A2 NOVEL WAX FOR REDUCING MAR AND ABRASION IN INKS AND COATINGS HRD CORP. (US) 2005-05-12 WO disclosed