Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 1/20 | 0.46 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.46 |
| ▸ | CA1 | P00915 | 1/20 | 0.45 |
| ▸ | CA2 | P00918 | 1/20 | 0.45 |
| ▸ | CA9 | Q16790 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.38 |
| ▸ | NPC1 | O15118 | 3/20 | 0.38 |
| ▸ | RAB9A | P51151 | 3/20 | 0.38 |
| ▸ | POLB | P06746 | 3/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 2/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2489381 | 0.85 | HDAC1 (0.42) | HDAC1HDAC6CA1CA2CA9 | |
| SCHEMBL27943823 | 0.84 | POLB (0.47) | HDAC1CA1CA2CA9ALDH1A1 | |
| SCHEMBL5831442 | 0.82 | ALDH1A1 (0.44) | CA1CA2CA9ALDH1A1HPGD | |
| SCHEMBL10803626 | 0.81 | NPC1 (0.43) | HDAC1HDAC6CA1CA2CA9 | |
| SCHEMBL6205970 | 0.79 | ALDH1A1 (0.55) | ALDH1A1HPGDSMN1; SMN2NPC1RAB9A | |
| SCHEMBL28297471 | 0.79 | POLB (0.52) | HDAC1CA1CA2CA9ALDH1A1 | |
| SCHEMBL21357 | 0.78 | CA1 (0.45) | CA1CA2CA9ALDH1A1HPGD | |
| SCHEMBL27193000 | 0.77 | TGM2 (0.46) | ALDH1A1LMNACYP2C19 | |
| SCHEMBL27544601 | 0.77 | CYP17A1 (0.44) | NPC1RAB9APOLBLMNA | |
| SCHEMBL220305 | 0.77 | ALDH1A1 (0.57) | ALDH1A1HPGDSMN1; SMN2NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023134708-A1 | THIAZOLOPYRIDYL AMIDE DERIVATIVES AS DNA POLYMERASE THETA INHIBITORS | BEIGENE , LTD. (KY) | 2023-07-20 | — | — | WO | disclosed |
| US-6043263-A | (2,3-dihydrobenzofuranyl)-thiazoles as phosphodiesterase inhibitors | BYK GULDEN LOMBERG CHEMISCHE FABRIK GMBH (DE) | 2000-03-28 | — | — | US | disclosed |
| EP-0941226-A1 | (2,3-DIHYDROBENZOFURANYL)-THIAZOLES AS PHOSPHODIESTERASE INHIBITORS | Byk Gulden Lomberg Chemische Fabrik GmbH (DE) | 1999-09-15 | — | — | EP | disclosed |
| EP-0510440-B1 | Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | CLARIANT GMBH (DE) | 1999-01-13 | — | — | EP | disclosed |
| WO-1998021207-A1 | (2,3-DIHYDROBENZOFURANYL)-THIAZOLES AS PHOSPHODIESTERASE INHIBITORS | BYK GULDEN LOMBERG CHEMISCHE FABRIK GMBH (DE) | 1998-05-22 | — | — | WO | disclosed |
| WO-1998008844-A1 | THIAZOLE DERIVATIVES USEFUL AS SELECTIVE INHIBITORS OF PDE-IV | BYK GULDEN LOMBERG CHEMISCHE FABRIK GMBH (DE) | 1998-03-05 | — | — | WO | disclosed |
| EP-0519298-B1 | Radiation-sensitive sulfonic acid esters and their use | HOECHST AG (DE) | 1995-09-13 | — | — | EP | disclosed |
| US-5442061-A | Recording, photoresists, printing plates | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-08-15 | — | — | US | disclosed |
| EP-0510443-B1 | Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | HOECHST AG (DE) | 1995-03-22 | — | — | EP | disclosed |
| US-5364734-A | Sulfonated triazines | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-11-15 | — | — | US | disclosed |
| US-5298364-A | Negative photoresists, acid crosslinking | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-03-29 | — | — | US | disclosed |
| US-5286867-A | Substituted 1-sulfonyloxy-2-pyridones and process for preparing them | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-02-15 | — | — | US | disclosed |
| US-5230985-A | NEGATIVE-WORKING RADIATION-SENSITIVE MIXTURES, AND RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED WITH THESE MIXTURES | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-07-27 | — | — | US | disclosed |
| US-5229254-A | Photoresists, printing plates, sulfonic acid generators | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-07-20 | — | — | US | disclosed |
| EP-0519298-A1 | Radiation-sensitive sulfonic acid esters and their use | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-12-23 | — | — | EP | disclosed |
| EP-0519299-A1 | Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-12-23 | — | — | EP | disclosed |
| EP-0510442-A1 | Substituted 1-sulfonyloxy-2-pyridones, process for their preparation and their use | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-28 | — | — | EP | disclosed |
| EP-0510443-A1 | Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-28 | — | — | EP | disclosed |
| EP-0510440-A1 | Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-28 | — | — | EP | disclosed |