⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8418924 | 1.00 | — | — | |
| SCHEMBL927141 | 1.00 | — | — | |
| SCHEMBL9171104 | 1.00 | — | — | |
| SCHEMBL445270 | 0.90 | FBP1 (0.31) | — | |
| SCHEMBL7118265 | 0.90 | FBP1 (0.31) | — | |
| SCHEMBL16534629 | 0.88 | TSHR (0.37) | — | |
| Fluoride Ion SCHEMBL7263681 | 0.87 | FBP1 (0.30) | — | |
| Fluoride Ion SCHEMBL7263684 | 0.87 | FBP1 (0.30) | — | |
| SCHEMBL18840028 | 0.86 | HPGD (0.39) | — | |
| Hexane SCHEMBL8532869 | 0.86 | CES2 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7338742-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-03-04 | — | — | US | claimed |
| US-7083893-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-08-01 | — | — | US | claimed |
| US-7022458-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-04-04 | — | — | US | claimed |
| US-20050089800-A1 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2005-04-28 | — | — | US | claimed |
| US-20050026070-A1 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2005-02-03 | — | — | US | claimed |
| US-20040265735-A1 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2004-12-30 | — | — | US | claimed |
| EP-0802954-A1 | METHOD OF PRINTING, PRINTING INK AND A METHOD OF MANUFACTURING THE SAME, AND THE USE THEREOF | Druckfarbenfabrik Gebr. Schmidt GmbH (DE) | 1997-10-29 | — | — | EP | claimed |
| WO-1996021702-A1 | METHOD OF PRINTING, PRINTING INK AND A METHOD OF MANUFACTURING THE SAME, AND THE USE THEREOF | DRUCKFARBENFABRIK GEBR. SCHMIDT GMBH (DE) | 1996-07-18 | — | — | WO | claimed |
| EP-0422570-B1 | Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions | IBM (US) | 1995-12-27 | — | — | EP | claimed |
| US-5059512-A | ULTRAVIOLET LIGHT SENSITIVE PHOTOINITIATOR COMPOSITIONS, USE THEREOF AND RADIATION SENSITIVE COMPOSITIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1991-10-22 | — | — | US | claimed |
| EP-0229917-B1 | A PROCESS FOR GENERATING A POSITIVE TONE PHOTORESIST | International Business Machines Corporation (US) | 1990-07-04 | — | — | EP | claimed |
| EP-0225454-B1 | POSITIVE RESIST SYSTEM HAVING HIGH RESISTANCE TO OXYGEN REACTIVE ION ETCHING | International Business Machines Corporation (US) | 1989-05-10 | — | — | EP | claimed |
| EP-2765148-B1 | Coatings based on epoxy and a method for their preparation and their uses | EL KUDSI KARIM (DE) | 2020-04-01 | — | — | EP | disclosed |
| EP-2765148-A1 | Coatings based on epoxy and a method for their preparation and their uses | El Kudsi, Karim (DE) | 2014-08-13 | — | — | EP | disclosed |
| US-8703238-B2 | Curable inkjet ink set and methods for inkjet printing | AGFA GRAPHICS NV (BE) | 2014-04-22 | — | — | US | disclosed |
| US-8507181-B2 | Method for developing and sealing of lithographic printing plates | KODAK (NEAR EAST) INC. | 2013-08-13 | — | — | US | disclosed |
| EP-0264908-A2 | High sensitivity resists having autodecomposition temperatures greater than about 160 C | International Business Machines Corporation (US) | 1988-04-27 | — | — | EP | disclosed |
| EP-0132710-B1 | LIGHT-SENSITIVE RECORDING MATERIAL FOR THE PRODUCTION OF RELIEF OR RESIST PATTERNS | BASF Aktiengesellschaft (DE) | 1987-01-21 | — | — | EP | disclosed |
| EP-0132710-A1 | Light-sensitive recording material for the production of relief or resist patterns | BASF Aktiengesellschaft (DE) | 1985-02-13 | — | — | EP | disclosed |
| US-4101513-A | ONIUM CATALYSTS OF GROUP 5A, 6A OR 7A ATOMS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1978-07-18 | — | — | US | disclosed |