Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FBP1 | P09467 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7118265 | 1.00 | FBP1 (0.31) | FBP1ALDH1A1LMNACYP3A4TDP1 | |
| Fluoride Ion SCHEMBL7263681 | 0.97 | FBP1 (0.30) | FBP1 | |
| Fluoride Ion SCHEMBL7263684 | 0.97 | FBP1 (0.30) | FBP1 | |
| SCHEMBL645902 | 0.91 | ALDH1A1 (0.31) | ALDH1A1LMNA | |
| SCHEMBL8418924 | 0.90 | — | — | |
| SCHEMBL740608 | 0.90 | — | — | |
| SCHEMBL9171104 | 0.90 | — | — | |
| SCHEMBL927141 | 0.90 | — | — | |
| SCHEMBL47554 | 0.82 | ALDH1A1 (0.40) | ALDH1A1LMNACYP3A4TDP1 | |
| SCHEMBL10801908 | 0.82 | ALDH1A1 (0.40) | ALDH1A1LMNACYP3A4TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 330 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12547072-B2 | Self-aligned build-up processing | GEMINATIO, INC. (US) | 2026-02-10 | — | — | US | claimed |
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| US-20250233019-A1 | MULTI-LEVEL SELECTIVE PATTERNING FOR STACKED DEVICE CREATION | GEMINATIO, INC. (US) | 2025-07-17 | — | — | US | claimed |
| CN-119923600-A | Chemically amplified positive resist composition for improving pattern profile and enhancing adhesion | YC化学制品株式会社 | 2025-05-02 | — | — | CN | claimed |
| US-20240419079-A1 | CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2024-12-19 | — | — | US | claimed |
| US-20240404828-A1 | SELF-ALIGNED BUILD-UP PROCESSING | GEMINATIO, INC. (US) | 2024-12-05 | — | — | US | claimed |
| CN-112313580-B | Chemical amplification type positive photoresist composition for improving pattern profile | 荣昌化学制品株式会社 | 2024-11-22 | — | — | CN | claimed |
| US-20240377749-A1 | ASSISTED FEATURE PLACEMENT IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2024-11-14 | — | — | US | claimed |
| CN-118251759-A | Multi-level selective patterning for stacked device creation | 杰米纳蒂奥公司 | 2024-06-25 | — | — | CN | claimed |
| CN-118215986-A | Chemoselective adhesion and strength promoters in semiconductor patterning | 杰米纳蒂奥公司 | 2024-06-18 | — | — | CN | claimed |
| US-20020155379-A1 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-24 | — | — | US | claimed |
| US-20020146642-A1 | Photosensitive polymers and resist compositions comprising the photosensitive polymers | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-10 | — | — | US | claimed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | claimed |
| US-6300036-B1 | COPOLYMER OF MALEIC ANHYDRIDE AND 2-NORBORNENE-5-METHANOL DERIVATIVE; ACCURATE PATTERNS WHEN EXPOSED TO ARGON FLUORIDE LASERS; DRY ETCHING RESISTANCE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-10-09 | — | — | US | claimed |
| US-20010024763-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-27 | — | — | US | claimed |
| US-6287747-B1 | CONTAINING ORGANOOXYGEN COMPOUNDS AND UNSATURATED COMPOUNDS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-11 | — | — | US | claimed |
| US-6143466-A | Chemically amplified photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-11-07 | — | — | US | claimed |
| US-6143465-A | Photosensitive polymer having cyclic backbone and resist composition comprising same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-11-07 | — | — | US | claimed |
| US-6080524-A | Photosensitive polymer having cyclic backbone and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-06-27 | — | — | US | claimed |
| EP-0921439-A1 | Photosensitive polymer and chemically amplified resist composition using the same | Samsung Electronics Co., Ltd. (KR) | 1999-06-09 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12547072-B2 | Self-aligned build-up processing | MYBBP1A, SMURF1, MYB | FBP1 2858/4885ALDH1A1 3094/4885LMNA 1133/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.