SCHEMBL741543

SCHEMBL741543

N#[N+]c1ccc(Nc2ccccc2)cc1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 7/20 0.62
▸ HSD17B10 Q99714 5/20 0.62
▸ ALOX12 P18054 4/20 0.62
▸ L3MBTL1 Q9Y468 4/20 0.62
▸ TSHR P16473 4/20 0.62
▸ TDP1 Q9NUW8 4/20 0.62
▸ ALOX15 P16050 2/20 0.62
▸ MAPK1 P28482 2/20 0.62
▸ PTGS1 P23219 1/20 0.62
▸ SLC6A2 P23975 1/20 0.62
▸ PTGS2 P35354 1/20 0.62
▸ HTR2B P41595 1/20 0.62
▸ MAPT P10636 7/20 0.50
▸ CYP3A4 P08684 5/20 0.50
▸ HPGD P15428 4/20 0.50
▸ HTT P42858 3/20 0.50
▸ CYP1A2 P05177 2/20 0.50
▸ CYP2C9 P11712 2/20 0.50
▸ CYP2C19 P33261 2/20 0.50
▸ MEN1 O00255 4/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL8910214 0.98 ALDH1A1 (0.59) ALDH1A1HSD17B10ALOX12L3MBTL1TSHR
Hydrochloric Acid SCHEMBL8911949 0.98 ALDH1A1 (0.59) ALDH1A1HSD17B10ALOX12L3MBTL1TSHR
Hydrochloric Acid SCHEMBL11570682 0.96 ALDH1A1 (0.56) ALDH1A1HSD17B10ALOX12L3MBTL1TSHR
Hydrochloric Acid SCHEMBL10936047 0.96 ALDH1A1 (0.56) ALDH1A1HSD17B10ALOX12L3MBTL1TSHR
Formaldehyde SCHEMBL8778614 0.94 ALDH1A1 (0.54) ALDH1A1HSD17B10ALOX12L3MBTL1TSHR
SCHEMBL5196671 0.92 ALDH1A1 (0.52) ALDH1A1HSD17B10ALOX12L3MBTL1TSHR
Sulfuric Acid SCHEMBL2959599 0.88 ALDH1A1 (0.48) ALDH1A1HSD17B10ALOX12L3MBTL1TSHR
Phosphoric Acid SCHEMBL5718136 0.88 ALDH1A1 (0.48) ALDH1A1HSD17B10ALOX12L3MBTL1TSHR
Sulfuric Acid SCHEMBL5718122 0.88 ALDH1A1 (0.48) ALDH1A1HSD17B10ALOX12L3MBTL1TSHR
Hydrochloric Acid SCHEMBL9445128 0.87 ALDH1A1 (0.41) ALDH1A1HSD17B10ALOX12L3MBTL1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 705 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115185155-A Method for preparing flexible micro-nano structure by using transferable photoresist 湖南大学 2022-10-14 — — CN claimed
US-11357884-B2 Electroactive bioadhesive compositions NANYANG TECHNOLOGICAL UNIVERSITY (SG) 2022-06-14 — — US claimed
CN-108859389-B Screen printing plate making method, screen printing plate and screen printing process 上海巨回印文化传播有限公司 2021-04-30 — — CN claimed
EP-3094358-B1 ELECTROACTIVE BIOADHESIVE COMPOSITIONS UNIV NANYANG TECH (SG) 2020-12-16 — — EP claimed
CN-105068379-B A kind of silk-screen printing photosensitive resin composition 田菱新材料(厦门)有限公司 2019-04-16 — — CN claimed
CN-108859389-A A kind of plate-making of screen process method, screen printing plate and silk-screen printing technique 上海巨回印文化传播有限公司 2018-11-23 — — CN claimed
CN-106226999-A A kind of method at the rapidly coating photoresists in half tone surface 村上精密制版(昆山)有限公司 2016-12-14 — — CN claimed
EP-3094358-A1 ELECTROACTIVE BIOADHESIVE COMPOSITIONS Nanyang Technological University (SG) 2016-11-23 — — EP claimed
US-20160331861-A1 ELECTROACTIVE BIOADHESIVE COMPOSITIONS NANYANG TECHNOLOGICAL UNIVERSITY (SG) 2016-11-17 — — US claimed
CN-103389619-B A kind of polyhydric alcohol polymer photoresists and preparation method thereof CHINA PETROLEUM & CHEMICAL CORP. (CN) 2015-12-16 — — CN claimed
US-4692397-A SUBSTRATE COATED WITH A DIAZONIUM SALT; COLORANT AND A POLYVINYL ACETAL RESIN; LITHOGRAPHIC PRINTING PLATES AMERICAN HOECHST CORPORATION (US) 1987-09-08 — — US claimed
US-4661432-A Light-sensitive, diazonium group-containing polycondensation product, process for its production, and light-sensitive recording material containing this polycondensation product HOECHST AKTIENGESELLSCHAFT (DE) 1987-04-28 — — US claimed
US-4659645-A PRINTING PLATES; PHOTORESISTS HOECHST AKTIENGESELLSCHAFT (DE) 1987-04-21 — — US claimed
CN-85106160-A Photosensitive composition and with this photosensitive material for preparing — 1987-03-04 — — CN claimed
EP-0074580-B1 LIGHT-SENSITIVE POLYCONDENSATION PRODUCT COMPRISING DIAZONIUM GROUPS, AND LIGHT-SENSITIVE RECORDING MATERIAL MADE THEREFROM HOECHST AKTIENGESELLSCHAFT (DE) 1986-12-03 — — EP claimed
US-4492748-A Light-sensitive polycondensation product containing diazonium and dialdehyde groups, and light-sensitive recording material prepared therewith HOECHST AKTIENGESELLSCHAFT, A CORP. OF GERMANY (DE) 1985-01-08 — — US claimed
US-4396700-A Process for forming an image FUJI PHOTO FILM CO., LTD. (JP) 1983-08-02 — — US claimed
US-4296194-A O-QUINONE DIAZIDE AND/OR DIAZONIUM COMPOUND, DECOMPOSITION, REACTION WITH AZO DYE TO PRODUCE DIFFERENT COLOR VICKERS LIMITED (GB) 1981-10-20 — — US claimed
US-4232105-A PHENOL-MODIFIED DIAZO RESIN-WATER SOLUBLE ACRYLIC POLYMER LAYER; AMINO RESIN-POLYAMIDE-PIGMENT LAYER; DURABILITY OJI PAPER CO., LTD. (JP) 1980-11-04 — — US claimed
US-4186006-A AQUEOUS DEVELOPER OF BENZYL ALCOHOL, A-METHYL-BENZYL ALCOHOL, PHENOXYETHANAL OR BENZYLOXYETHANOL, ANIONIC SURFACTANT, AND WATER-SOLUBLE SULFITE FUJI PHOTO FILM CO., LTD. (JP) 1980-01-29 — — US claimed
Send feedback