Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 known ✓ | P23975 | 1/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.59 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.59 |
| ▸ | ALOX12 | P18054 | 4/20 | 0.59 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.59 |
| ▸ | TSHR | P16473 | 4/20 | 0.59 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.59 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.59 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.59 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.59 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.59 |
| ▸ | HTR2B | P41595 | 1/20 | 0.59 |
| ▸ | MAPT | P10636 | 6/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 5/20 | 0.48 |
| ▸ | HPGD | P15428 | 3/20 | 0.48 |
| ▸ | HTT | P42858 | 2/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.48 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 3/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL11570682 | 0.98 | ALDH1A1 (0.56) | ALDH1A1HSD17B10ALOX12L3MBTL1TSHR | |
| Hydrochloric Acid SCHEMBL10936047 | 0.98 | ALDH1A1 (0.56) | ALDH1A1HSD17B10ALOX12L3MBTL1TSHR | |
| SCHEMBL741543 | 0.98 | ALDH1A1 (0.62) | ALDH1A1HSD17B10ALOX12L3MBTL1TSHR | |
| Bromide SCHEMBL8910214 | 0.95 | ALDH1A1 (0.59) | ALDH1A1HSD17B10ALOX12L3MBTL1TSHR | |
| Formaldehyde SCHEMBL8778614 | 0.91 | ALDH1A1 (0.54) | ALDH1A1HSD17B10ALOX12L3MBTL1TSHR | |
| Hydrochloric Acid SCHEMBL9445128 | 0.91 | ALDH1A1 (0.41) | ALDH1A1HSD17B10ALOX12L3MBTL1TSHR | |
| SCHEMBL5196671 | 0.90 | ALDH1A1 (0.52) | ALDH1A1HSD17B10ALOX12L3MBTL1TSHR | |
| Sulfuric Acid SCHEMBL5718122 | 0.86 | ALDH1A1 (0.48) | ALDH1A1HSD17B10ALOX12L3MBTL1TSHR | |
| Sulfuric Acid SCHEMBL2959599 | 0.86 | ALDH1A1 (0.48) | ALDH1A1HSD17B10ALOX12L3MBTL1TSHR | |
| Phosphoric Acid SCHEMBL5718136 | 0.86 | ALDH1A1 (0.48) | ALDH1A1HSD17B10ALOX12L3MBTL1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5538825-A | Printing plate preparation process | XEROX CORPORATION (US) | 1996-07-23 | — | — | US | claimed |
| US-5102756-A | Camera speed printing plate with in situ mask | XEROX CORPORATION (US) | 1992-04-07 | — | — | US | claimed |
| US-4248959-A | Preparation of diazo printing plates using laser exposure | AMERICAN HOECHST CORPORATION (US) | 1981-02-03 | — | — | US | claimed |
| US-4130426-A | Heat developable light-sensitive diazotype materials and process of use | FUJI PHOTO FILM CO., LTD. (JP) | 1978-12-19 | — | — | US | claimed |
| JP-58137834-A | — | — | None | — | — | JP | disclosed |
| US-11635694-B2 | Method for making a lithographic printing plate | AGFA OFFSET BV (BE) | 2023-04-25 | — | — | US | disclosed |
| US-20220066318-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR | ECO3 BV (BE) | 2022-03-03 | — | — | US | disclosed |
| EP-3894958-A1 | A LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA NV (BE) | 2021-10-20 | — | — | EP | disclosed |
| EP-3495891-B1 | A METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE | AGFA NV (BE) | 2021-06-16 | — | — | EP | disclosed |
| US-20210173308-A1 | A METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE | ECO3 BV (BE) | 2021-06-10 | — | — | US | disclosed |
| EP-3548970-A1 | METHOD OF MAKING A LITHOGRAPHIC PRINTING PLATE PRECURSOR CONTAINING A DIAZONIUM COMPOUND | AGFA NV (BE) | 2019-10-09 | — | — | EP | disclosed |
| CN-110023840-A | The method for manufacturing the Lighographic printing plate precursor containing diazonium compound | 爱克发有限公司 | 2019-07-16 | — | — | CN | disclosed |
| US-4186069-A | PARTICLES OF WATER-INSOLUBLE POLYMERS IN COMBINATION WITH WATER-SOLUBLE, LIGHT-SENSITIVE POLYMERS | RICHARDSON GRAPHICS COMPANY (US) | 1980-01-29 | — | — | US | disclosed |
| US-4186017-A | Light-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-29 | — | — | US | disclosed |
| US-4179292-A | Light-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1979-12-18 | — | — | US | disclosed |
| US-4153461-A | PRESENSITIZED ALUMINUM CONTAINING ANODIC ALUMINUM OXIDE REACTED WITH POLYVINYLPHOSPHONIC ACID | HOECHST AKTIENGESELLSCHAFT (DE) | 1979-05-08 | — | — | US | disclosed |
| US-4130426-A | Heat developable light-sensitive diazotype materials and process of use | FUJI PHOTO FILM CO., LTD. (JP) | 1978-12-19 | — | — | US | disclosed |
| US-4039521-A | PHOTOSENSITIVITY | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1977-08-02 | — | — | US | disclosed |
| US-4035144-A | Dyeing preparations containing boric acid for preparing water-insoluble azo dyestuffs on fiber | HOECHST AKTIENGESELLSCHAFT (DT) | 1977-07-12 | — | — | US | disclosed |
| US-4016814-A | Planographic printing master | XEROX CORPORATION (US) | 1977-04-12 | — | — | US | disclosed |