⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1237733 | 0.78 | LAP3 (0.41) | — | |
| SCHEMBL20024365 | 0.78 | — | — | |
| SCHEMBL8765077 | 0.75 | LAP3 (0.39) | — | |
| SCHEMBL1191781 | 0.73 | — | — | |
| Phosphoric Acid SCHEMBL1832724 | 0.71 | CA2 (0.35) | — | |
| SCHEMBL282484 | 0.71 | FDPS (0.50) | — | |
| SCHEMBL6886907 | 0.71 | FDPS (0.64) | — | |
| SCHEMBL6684076 | 0.69 | — | — | |
| SCHEMBL6406638 | 0.69 | — | — | |
| SCHEMBL5676951 | 0.69 | FDPS (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12427472-B2 | Process for removal of acid gases from a fluid stream | BASF SE (DE) | 2025-09-30 | — | — | US | disclosed |
| CN-114173908-B | Method for removing acid gases from fluid streams | 巴斯夫欧洲公司 | 2025-04-01 | — | — | CN | disclosed |
| US-12138583-B2 | Process for removal of acid gases from a fluid stream with a liquid absorbent comprising a piperazine ring | BASF SE (DE) | 2024-11-12 | — | — | US | disclosed |
| CN-113453784-B | Method for removing acid gases from fluid streams | 巴斯夫欧洲公司 | 2024-09-13 | — | — | CN | disclosed |
| US-20240042375-A1 | PROCESS FOR REMOVAL OF ACID GASES FROM A FLUID STREAM | BASF SE (DE) | 2024-02-08 | — | — | US | disclosed |
| EP-4028148-B1 | PROCESS FOR REMOVAL OF ACID GASES FROM A FLUID STREAM | BASF SE (DE) | 2023-11-15 | — | — | EP | disclosed |
| EP-3927450-B1 | PROCESS FOR REMOVAL OF ACID GASES FROM A FLUID STREAM WITH A LIQUID ABSORBENT COMPRISING A PIPERAZINE RING | BASF SE (DE) | 2023-06-07 | — | — | EP | disclosed |
| CN-110382084-B | Process for removing acid gases from fluid streams | 巴斯夫欧洲公司 | 2023-01-17 | — | — | CN | disclosed |
| US-11458433-B2 | Absorbent and process for selectively removing hydrogen sulfide | BASF SE (DE) | 2022-10-04 | — | — | US | disclosed |
| EP-4028148-A1 | PROCESS FOR REMOVAL OF ACID GASES FROM A FLUID STREAM | BASF SE (DE) | 2022-07-20 | — | — | EP | disclosed |
| US-20020172889-A1 | Comprises support having water-wettable surface and heat-sensitive layer which exhibits high sensitivity and is fit for scanning exposure based on digital signals | FUJIFILM CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1228865-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2002-08-07 | — | — | EP | disclosed |
| US-20020007751-A1 | Lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1170123-A2 | Negative-working planographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2002-01-09 | — | — | EP | disclosed |
| US-20010046638-A1 | On a water receptive substrate, a heat-sensitive layer comprising microcapsules containing a compound having thermally reactive functional group, which reacts with a compound in the light sensitive layer; storage stability | FUJIFILM CORPORATION (JP) | 2001-11-29 | — | — | US | disclosed |
| EP-1147885-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2001-10-24 | — | — | EP | disclosed |
| EP-1145848-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2001-10-17 | — | — | EP | disclosed |
| EP-1132200-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2001-09-12 | — | — | EP | disclosed |
| US-20010018159-A1 | Lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1096315-A1 | Negative-type image recording material and precursor for negative-type lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |