SCHEMBL7460164

SCHEMBL7460164

CN(C)c1ccc2ccc(=O)oc2c1.O=C1OCc2cccc1c2

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PGR P06401 12/20 0.47
KDM4E B2RXH2 3/20 0.46
ALDH1A1 P00352 3/20 0.46
GLA P06280 2/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
SLC16A3 O15427 1/20 0.40
ACHE P22303 1/20 0.38
CYP19A1 P11511 1/20 0.38
NR3C1 P04150 1/20 0.37
AR P10275 1/20 0.37
CA12 O43570 2/20 0.37
CA1 P00915 2/20 0.37
AKR1B1 P15121 2/20 0.37
HPGD P15428 2/20 0.37
CA9 Q16790 2/20 0.37
HSD17B10 Q99714 2/20 0.37
CA3 P07451 1/20 0.37
CA4 P22748 1/20 0.37
CA6 P23280 1/20 0.37
CA5A P35218 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17294129 0.80 PGR (0.55) PGRKDM4EALDH1A1GLAL3MBTL1
SCHEMBL29007333 0.80 KDM4E (0.67) PGRKDM4EALDH1A1GLAL3MBTL1
SCHEMBL30480281 0.80 KDM4E (0.67) PGRKDM4EALDH1A1GLAL3MBTL1
SCHEMBL214310 0.80 KDM4E (0.67) PGRKDM4EALDH1A1GLAL3MBTL1
Hydrochloric Acid SCHEMBL28215018 0.72 KMT2A (0.41) KDM4EALDH1A1HPGDHSD17B10MEN1
SCHEMBL10878207 0.71 KDM4E (0.52) PGRKDM4EALDH1A1GLAL3MBTL1
Coumarin SCHEMBL28308230 0.70 RAB9A (0.62) PGRKDM4EALDH1A1GLAL3MBTL1
SCHEMBL15398186 0.69 PGR (0.76) PGRKDM4EALDH1A1GLAL3MBTL1
SCHEMBL10879416 0.69 ALDH1A1 (0.83) PGRKDM4EALDH1A1GLAL3MBTL1
SCHEMBL28989965 0.68 KMT2A (0.41) KDM4EALDH1A1HPGDHSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6482569-B1 Process for forming a polyimide pattern with photosensitive composition for i-line stepper ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-11-19 US disclosed
EP-0718696-B1 Photosensitive polyimide precursor composition ASAHI CHEMICAL IND (JP) 2002-01-16 EP disclosed
US-6162580-A Photosensitive polyimide precursor compositions processable by exposure to short wavelength light ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 2000-12-19 US disclosed
EP-0580108-B1 A photosensitive polyimide composition ASAHI CHEMICAL IND (JP) 1997-03-12 EP disclosed
EP-0718696-A2 A photosensitive polyimide composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1996-06-26 EP disclosed
EP-0580108-A2 A photosensitive polyimide composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1994-01-26 EP disclosed