SCHEMBL74818

SCHEMBL74818

Ic1ccc(Oc2cccc(I)c2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
MEN1 O00255 1/20 0.50
MITF O75030 1/20 0.50
GAA P10253 1/20 0.50
MAPT P10636 1/20 0.50
GFER P55789 1/20 0.50
KMT2A Q03164 1/20 0.50
NLRP1 Q9C000 1/20 0.50
NOD2 Q9HC29 1/20 0.50
TNKS O95271 1/20 0.44
PARP15 Q460N3 1/20 0.44
PARP14 Q460N5 1/20 0.44
PARP10 Q53GL7 1/20 0.44
TNKS2 Q9H2K2 1/20 0.44
PARP2 Q9UGN5 1/20 0.44
AKR1C3 P42330 1/20 0.44
MAOB P27338 1/20 0.43
FURIN P09958 2/20 0.42
F2 P00734 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3839195 0.95 ALDH1A1 (0.54) ALDH1A1SMN1; SMN2MEN1MITFGAA
SCHEMBL3839098 0.95 ALDH1A1 (0.54) ALDH1A1SMN1; SMN2MEN1MITFGAA
SCHEMBL3845675 0.93 SMN1; SMN2 (0.58) ALDH1A1SMN1; SMN2MEN1MITFGAA
SCHEMBL3843620 0.91 SMN1; SMN2 (0.60) ALDH1A1SMN1; SMN2MEN1MITFGAA
SCHEMBL3843809 0.91 SMN1; SMN2 (0.60) ALDH1A1SMN1; SMN2MEN1MITFGAA
SCHEMBL30148759 0.91 ALDH1A1 (0.46) ALDH1A1SMN1; SMN2MEN1MITFGAA
SCHEMBL3841098 0.91 ALDH1A1 (0.46) ALDH1A1SMN1; SMN2MEN1MITFGAA
SCHEMBL7560564 0.88 LTA4H (0.57) ALDH1A1SMN1; SMN2MEN1MITFGAA
SCHEMBL3845360 0.88 SMN1; SMN2 (0.50) ALDH1A1SMN1; SMN2MEN1MITFGAA
SCHEMBL23894336 0.85 ALDH1A1 (0.45) ALDH1A1SMN1; SMN2MEN1MITFGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8129081-B2 Photoconductive imaging members XEROX CORPORATION (US) 2012-03-06 US claimed
US-20100068639-A1 PHOTOCONDUCTIVE IMAGING MEMBERS XEROX CORPORATION (US) 2010-03-18 US claimed
EP-0522469-A2 Preparation of poly(benz(ox, imid, thi)azole) polymers EASTMAN KODAK COMPANY (US) 1993-01-13 EP claimed
US-5149755-A Aroatmic amine and halide reactants EASTMAN KODAK COMPANY (US) 1992-09-22 US claimed
US-8129081-B2 Photoconductive imaging members XEROX CORPORATION (US) 2012-03-06 US disclosed
WO-2010096462-A1 LINKED DIIMIDAZOLE DERIVATIVES ENANTA PHARMACEUTICALS, INC (US) 2010-08-26 WO disclosed
US-20100068639-A1 PHOTOCONDUCTIVE IMAGING MEMBERS XEROX CORPORATION (US) 2010-03-18 US disclosed
EP-1245638-B1 Composition for insulating film formation JSR CORP (JP) 2009-01-14 EP disclosed
EP-1188807-B1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORP (JP) 2007-10-17 EP disclosed
EP-1099719-B1 Diyne-containing (co) polymer, processes for producing the same, and cured film JSR CORP (JP) 2007-01-17 EP disclosed
US-7153767-B2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2006-12-26 US disclosed
US-6852370-B2 Composition for film formation and material for insulating film formation JSR CORPORATION (JP) 2005-02-08 US disclosed
US-20020172652-A1 Composition for film formation and material for insulating film formation JSR CORPORATION (JP) 2002-11-21 US disclosed
EP-1245638-A1 Composition for insulating film formation JSR Corporation (JP) 2002-10-02 EP disclosed
US-20020064953-A1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2002-05-30 US disclosed
EP-1188807-A2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR Corporation (JP) 2002-03-20 EP disclosed
EP-1099719-A1 Diyne-containing (co) polymer, processes for producing the same, and cured film JSR Corporation (JP) 2001-05-16 EP disclosed
EP-0347878-B1 Method for manufacturing polyamide resin TOSOH CORP (JP) 1994-09-07 EP disclosed
EP-0522469-A2 Preparation of poly(benz(ox, imid, thi)azole) polymers EASTMAN KODAK COMPANY (US) 1993-01-13 EP disclosed
EP-0347878-A2 Method for manufacturing polyamide resin Tosoh Corporation (JP) 1989-12-27 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020172652-A1 Composition for film formation and material for insulating film formation VCL, BMI1, PUF60 ALDH1A1 2731/4885SMN1; SMN2 3834/4885MEN1 4309/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.