Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19881129 | 1.00 | ALDH1A1 (0.33) | ALDH1A1GAAMAPT | |
| SCHEMBL10040357 | 0.97 | ALDH1A1 (0.30) | ALDH1A1GAAMAPT | |
| SCHEMBL17829490 | 0.94 | GABRP (0.32) | — | |
| SCHEMBL14219529 | 0.87 | ALDH1A1 (0.32) | ALDH1A1GAAMAPT | |
| SCHEMBL14523966 | 0.87 | ALDH1A1 (0.32) | ALDH1A1GAAMAPT | |
| SCHEMBL4403804 | 0.86 | ALDH1A1 (0.31) | ALDH1A1GAAMAPT | |
| SCHEMBL9609346 | 0.85 | ALOX15 (0.36) | ALDH1A1GAAMAPT | |
| SCHEMBL4399250 | 0.84 | — | — | |
| SCHEMBL14523970 | 0.84 | ALDH1A1 (0.30) | ALDH1A1GAAMAPT | |
| SCHEMBL13113310 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 571 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119866360-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2025-04-22 | — | — | CN | disclosed |
| CN-119856108-A | Liquid crystal aligning agent and liquid crystal display element | 日产化学株式会社 | 2025-04-18 | — | — | CN | disclosed |
| EP-3616878-B1 | EXTRUDED RESIN PLATE AND MANUFACTURING METHOD THEREOF | KURARAY CO (JP) | 2024-12-18 | — | — | EP | disclosed |
| CN-118302462-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2024-07-05 | — | — | CN | disclosed |
| CN-118235084-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | 日产化学株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-117677669-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2024-03-08 | — | — | CN | disclosed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| CN-116601191-A | Method for producing single-layer retardation film, and polymer composition for forming single-layer retardation film | 日产化学株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116507968-A | Radical generating film forming composition, radical generating film, method for manufacturing liquid crystal display element, and liquid crystal display element | 日产化学株式会社 | 2023-07-28 | — | — | CN | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| EP-1752479-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2007-02-14 | — | — | EP | disclosed |
| EP-1004568-B1 | Novel ester compounds, polymers, resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2006-01-25 | — | — | EP | disclosed |
| CN-1234047-C | Chemical amplification light resistance agent compsn. | AMERICAN EVERBRIGHT CORP (US) | 2005-12-28 | — | — | CN | disclosed |
| CN-1462909-A | Chemical amplification light resistance agent compsn. | AMERICAN EVERBRIGHT CORP (US) | 2003-12-24 | — | — | CN | disclosed |
| US-6517994-B2 | Amplified photoresist | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-02-11 | — | — | US | disclosed |
| US-6441115-B1 | FOR USE AS CHEMICAL AMPLIFIED PHOTORESIST, COMPRISING UNITS DERIVED FROM (METH)ACRYLIC ACID, 2-ALKYL,5,6-(-(CH2)N-)NORBORN-2-YL ESTER WHERE N IS 2-6 | EVERLIGHT USA, INC. | 2002-08-27 | — | — | US | disclosed |
| US-6312867-B1 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-06 | — | — | US | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |