Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.30 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9610635 | 0.86 | MAPT (0.33) | ALDH1A1GPR35MAPTAPOBEC3AAPOBEC3G | |
| SCHEMBL9628797 | 0.85 | ALDH1A1 (0.32) | ALDH1A1GPR35MAPTAPOBEC3AAPOBEC3G | |
| SCHEMBL17532375 | 0.85 | HCRTR2 (0.34) | ALDH1A1GPR35MAPTAPOBEC3AAPOBEC3G | |
| SCHEMBL13716018 | 0.84 | GPR35 (0.31) | GPR35 | |
| SCHEMBL14559889 | 0.84 | MAPT (0.33) | ALDH1A1GPR35MAPTAPOBEC3AAPOBEC3G | |
| SCHEMBL74764 | 0.84 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL18485034 | 0.83 | MAPT (0.33) | MAPTAPOBEC3AAPOBEC3G | |
| SCHEMBL18377109 | 0.83 | — | — | |
| SCHEMBL15183384 | 0.82 | GPR35 (0.30) | GPR35 | |
| SCHEMBL18253569 | 0.81 | MAPT (0.36) | ALDH1A1MAPTAPOBEC3AAPOBEC3G |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 317 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11786160-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-20230159766-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-11357970-B2 | Biomedical electrode composition, biomedical electrode and method for manufacturing the biomedical electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-14 | — | — | US | disclosed |
| EP-3693979-B1 | CONDUCTIVE POLYMER COMPOSITE AND CONDUCTIVE POLYMER COMPOSITION | SHINETSU CHEMICAL CO (JP) | 2022-05-04 | — | — | EP | disclosed |
| US-11208509-B2 | Polymer compound for conductive polymer and method for producing same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-28 | — | — | US | disclosed |
| US-20210389671-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2021-12-16 | — | — | US | disclosed |
| US-20210380738-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-09 | — | — | US | disclosed |
| US-11071485-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-07-27 | — | — | US | disclosed |
| US-10851188-B2 | Polymer compound for conductive polymer and method for producing same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-12-01 | — | — | US | disclosed |
| US-20070207408-A1 | Polymers, positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-09-06 | — | — | US | disclosed |
| US-20070207408-A1 | Polymers, positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-09-06 | — | — | US | disclosed |
| US-7255973-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-14 | — | — | US | disclosed |
| US-7255973-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-14 | — | — | US | disclosed |
| US-20070111140-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20070111140-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20070087125-A1 | Process for producing top coat film used in lithography | CENTRAL GLASS COMPANY, LIMITED. (JP) | 2007-04-19 | — | — | US | disclosed |
| US-20070087125-A1 | Process for producing top coat film used in lithography | CENTRAL GLASS COMPANY, LIMITED. (JP) | 2007-04-19 | — | — | US | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |