Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.54 |
| ▸ | TSHR | P16473 | 8/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.50 |
| ▸ | TP53 | P04637 | 2/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.42 |
| ▸ | NPC1 | O15118 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | RAB9A | P51151 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | GLA | P06280 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.41 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1104227 | 0.88 | TSHR (0.57) | ALDH1A1TSHRTDP1L3MBTL1CYP3A4 | |
| SCHEMBL22926492 | 0.87 | TSHR (0.51) | ALDH1A1TSHRTDP1L3MBTL1CYP3A4 | |
| SCHEMBL11938275 | 0.86 | ALDH1A1 (0.51) | ALDH1A1TSHRTDP1L3MBTL1CYP3A4 | |
| SCHEMBL14483832 | 0.85 | TDP1 (0.59) | ALDH1A1TSHRTDP1L3MBTL1CYP3A4 | |
| SCHEMBL751080 | 0.85 | HSD17B10 (0.42) | ALDH1A1TSHRTDP1L3MBTL1CYP3A4 | |
| SCHEMBL12126281 | 0.85 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1L3MBTL1CYP3A4 | |
| SCHEMBL19407216 | 0.85 | ALDH1A1 (0.49) | ALDH1A1TSHRTDP1L3MBTL1CYP3A4 | |
| SCHEMBL12126321 | 0.84 | ALDH1A1 (0.56) | ALDH1A1TSHRTDP1L3MBTL1CYP3A4 | |
| SCHEMBL12126278 | 0.83 | CSNK2A1 (0.40) | ALDH1A1TSHRTDP1L3MBTL1MAPK1 | |
| SCHEMBL1104237 | 0.83 | TSHR (0.39) | ALDH1A1TSHRTDP1L3MBTL1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 153 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11912808-B2 | Curable composition, cured product, color filter, solid-state imaging element, and image display device | FUJIFILM CORPORATION (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240032186-A1 | STRUCTURE, METHOD FOR MANUFACTURING STRUCTURE, AND COMPOSITION | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240032186-A1 | STRUCTURE, METHOD FOR MANUFACTURING STRUCTURE, AND COMPOSITION | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230384485-A1 | COLORING COMPOSITION, CURED FILM, LIGHT SHIELDING FILM, COLOR FILTER, OPTICAL ELEMENT, SOLID-STATE IMAGING ELEMENT, INFRARED SENSOR, AND HEADLIGHT UNIT | FUJIFILM CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-11776977-B2 | Laminate and solid-state imaging element | FUJIFILM CORPORATION (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230275221-A1 | ELECTRODE COMPOSITION, ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND ALL-SOLID STATE SECONDARY BATTERY, AND MANUFACTURING METHODS FOR ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY AND ALL-SOLID STATE SECONDARY BATTERY | FUJIFILM CORPORATION (JP) | 2023-08-31 | — | — | US | disclosed |
| US-11733435-B2 | Polarizing plate protective film, polarizing plate, and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2023-08-22 | — | — | US | disclosed |
| US-11718695-B2 | Curable composition, cured product, color filter, method for producing color filter, solid imaging element, and image display device | FUJIFILM CORPORATION (JP) | 2023-08-08 | — | — | US | disclosed |
| US-20230220210-A1 | COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, INFRARED SENSOR, CAMERA MODULE, COMPOUND, AND INFRARED ABSORBER | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-11698479-B2 | Structure, solid image pickup element, infrared sensor, and composition | FUJIFILM CORPORATION (JP) | 2023-07-11 | — | — | US | disclosed |
| US-20090263635-A1 | WATER-INSOLUBLE COLORANT DISPERSION AND PRODUCTION METHOD THEREOF, AND RECORDING LIQUID, INK SET, PRINTED ARTICLE, IMAGE-FORMING METHOD AND IMAGE-FORMING APPARATUS USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-10-22 | — | — | US | disclosed |
| US-20090087787-A1 | PLANOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PRODUCING A COPOLYMER USED THEREIN | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090053626-A1 | COLORED PHOTOSENSITIVE COMPOSITION, COLOR FILTER, AND METHOD FOR MANUFACTURING COLOR FILTER | FUJIFILM CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| US-7445881-B2 | Method of manufacturing semiconductor device, acid etching resistant material and copolymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2008-11-04 | — | — | US | disclosed |
| US-20080261149-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, ACID ETCHING RESISTANCE MATERIAL AND COPOLYMER | ASAKAWA KOJI | 2008-10-23 | — | — | US | disclosed |
| US-20080138744-A1 | Anti-Reflective Coating Forming Composition Containing Vinyl Ether Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-06-12 | — | — | US | disclosed |
| US-20070138139-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, ACID ETCHING RESISTANCE MATERIAL AND COPOLYMER | ASAKAWA KOJI | 2007-06-21 | — | — | US | disclosed |
| US-20070142592-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, ACID ETCHING RESISTANCE MATERIAL AND COPOLYMER | ASAKAWA KOJI | 2007-06-21 | — | — | US | disclosed |
| US-7217498-B2 | Multilayer; support with image forming layer containing water insoluble polymer and soluble in alkaline aqueous solutions | FUJIFILM CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| US-7208334-B2 | Method of manufacturing semiconductor device, acid etching resistance material and copolymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-04-24 | — | — | US | disclosed |