SCHEMBL1104227

SCHEMBL1104227

CCC(C)(C)C(=O)OCCOC(=O)c1ccccc1C(=O)OC

nearest known ligand 0.57

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.57
ALDH1A1 P00352 8/20 0.54
TDP1 Q9NUW8 2/20 0.51
L3MBTL1 Q9Y468 2/20 0.51
CYP3A4 P08684 2/20 0.50
MAPK1 P28482 2/20 0.50
TP53 P04637 1/20 0.50
LMNA P02545 3/20 0.49
CYP1A2 P05177 1/20 0.44
CYP2C19 P33261 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
HSD17B10 Q99714 2/20 0.42
CFTR P13569 1/20 0.42
KDM4E B2RXH2 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA5A P35218 1/20 0.42
CA9 Q16790 1/20 0.42
KMT2A Q03164 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL751954 0.88 ALDH1A1 (0.54) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL14483832 0.85 TDP1 (0.59) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL12126276 0.82 ALDH1A1 (0.46) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL12126325 0.82 ALDH1A1 (0.46) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL1104236 0.82 ALDH1A1 (0.46) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL12126321 0.81 ALDH1A1 (0.56) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL801373 0.80 LMNA (0.62) TSHRALDH1A1TDP1MAPK1LMNA
SCHEMBL13174552 0.80 ALDH1A1 (0.44) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL12377229 0.79 TSHR (0.89) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL5164954 0.79 ALDH1A1 (0.85) TSHRALDH1A1TDP1L3MBTL1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291897-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2016-03-22 US disclosed
US-20150185610-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-07-02 US disclosed
US-8151705-B2 Method of preparing lithographic printing plate FUJIFILM CORPORATION (JP) 2012-04-10 US disclosed
US-20100081771-A1 METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed