Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB2 | P17787 | 3/20 | 0.35 |
| ▸ | CHRNA3 | P32297 | 3/20 | 0.35 |
| ▸ | CHRNA4 | P43681 | 3/20 | 0.35 |
| ▸ | CHRNB4 | P30926 | 2/20 | 0.35 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | CHRNB3 | Q05901 | 1/20 | 0.31 |
| ▸ | CHRNA6 | Q15825 | 1/20 | 0.31 |
| ▸ | MMP1 | P03956 | 1/20 | 0.31 |
| ▸ | MMP3 | P08254 | 1/20 | 0.31 |
| ▸ | MMP7 | P09237 | 1/20 | 0.31 |
| ▸ | MMP9 | P14780 | 1/20 | 0.31 |
| ▸ | MMP13 | P45452 | 1/20 | 0.31 |
| ▸ | HTR2A | P28223 | 1/20 | 0.31 |
| ▸ | HTR2C | P28335 | 1/20 | 0.31 |
| ▸ | HTR6 | P50406 | 1/20 | 0.31 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.30 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Piperazine SCHEMBL28147717 | 0.96 | CHRNB2 (0.33) | CHRNB2CHRNA3CHRNA4CHRNB4CHRNA7 | |
| SCHEMBL7348922 | 0.86 | ATM (0.43) | CHRNB2CHRNA3CHRNA4CHRNB4CHRNA7 | |
| SCHEMBL8498877 | 0.85 | HTR2A (0.32) | HTR2AHTR2C | |
| SCHEMBL7349678 | 0.85 | ATM (0.36) | CHRNB2CHRNA3CHRNA4CHRNB4CHRNA7 | |
| SCHEMBL6989956 | 0.85 | KDM4E (0.32) | ATM | |
| SCHEMBL26427037 | 0.82 | MMP2 (0.46) | CHRNB2CHRNA3CHRNA4CHRNB4CHRNA7 | |
| SCHEMBL15432299 | 0.82 | CHRNB2 (0.37) | CHRNB2CHRNA3CHRNA4CHRNB4CHRNA7 | |
| SCHEMBL18231611 | 0.82 | DPP4 (0.33) | CHRNB2CHRNA3CHRNA4CHRNB4CHRNA7 | |
| SCHEMBL15432009 | 0.82 | MMP2 (0.46) | CHRNB2CHRNA3CHRNA4CHRNB4CHRNA7 | |
| Hydrochloric Acid SCHEMBL29024753 | 0.80 | MMP2 (0.45) | CHRNB2CHRNA3CHRNA4CHRNB4CHRNA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3131989-B1 | LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE AND POLYAMIDE AMIC ACID RESIN COATING | CYMER DAYTON LLC (US) | 2022-11-09 | — | — | EP | claimed |
| US-10301506-B2 | Full scale process for preparing polymer powders | CYMER-DAYTON, LLC (US) | 2019-05-28 | — | — | US | claimed |
| EP-3464422-A1 | FULL SCALE PROCESS FOR PREPARING POLYMER POWDERS | Cymer-Dayton, LLC (US) | 2019-04-10 | — | — | EP | claimed |
| CN-109415508-A | Full-size process for preparing polymer powders | 西莫-戴顿有限责任公司 | 2019-03-01 | — | — | CN | claimed |
| WO-2017214055-A1 | FULL SCALE PROCESS FOR PREPARING POLYMER POWDERS | CYMER-DAYTON, LLC (US) | 2017-12-14 | — | — | WO | claimed |
| US-20170349713-A1 | FULL SCALE PROCESS FOR PREPARING POLYMER POWDERS | CYMER-DAYTON, LLC | 2017-12-07 | — | — | US | claimed |
| CN-107286137-A | Deuterated dehydrogenase 13-benzoyloxy phenyl ahistins class compound and preparation method thereof and the application in anti-tumor drug is prepared | 青岛海洋生物医药研究院股份有限公司 | 2017-10-24 | — | — | CN | claimed |
| US-9751986-B2 | Low toxicity solvent system for polyamideimide resins and solvent system manufacture | FUJIFILM HUNT CHEMICALS US, INC. (US) | 2017-09-05 | — | — | US | claimed |
| US-9725617-B2 | Low toxicity solvent system for polyamideimide and polyamide amic acid resin coating | FUJIFILM HUNT CHEMICALS U.S.A., INC. (US) | 2017-08-08 | — | — | US | claimed |
| CN-106715616-A | Low toxicity solvent system for the manufacture of polyamideimide and polyamideamic acid resins | 富士胶片亨特化学制品美国有限公司 | 2017-05-24 | — | — | CN | claimed |
| US-20150299393-A1 | LOW TOXICITY SOLVENT SYSTEM FOR POLYAMDIEIMIDE AND POLYAMIDE AMIC ACID RESIN MANUFACTURE | CYMER-DAYTON, LLC | 2015-10-22 | — | — | US | claimed |
| US-20150299513-A1 | LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE AND POLYAMIDE AMIC ACID RESIN COATING | CYMER-DAYTON, LLC | 2015-10-22 | — | — | US | claimed |
| WO-2015161131-A1 | LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE AND POLYAMIDE AMIC ACID RESIN COATING | FUJIFILM HUNT CHEMICALS US, INC. (US) | 2015-10-22 | — | — | WO | claimed |
| WO-2015161107-A1 | LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE AND POLYAMIDE AMIC ACID RESIN MANUFACTURE | FUJIFILM HUNT CHEMICALS US, INC. (US) | 2015-10-22 | — | — | WO | claimed |
| US-9029441-B2 | Low toxicity solvent system for polyamideimide and polyamide amic acid resins and coating solutions thereof | FUJIFILM HUNT CHEMICALS US, INC. (US) | 2015-05-12 | — | — | US | claimed |
| CN-104144968-A | Low toxicity solvent system for polyamideimide resins and preparation of solvent system | FUJIFILM HUNT CHEMICALS US INC | 2014-11-12 | — | — | CN | claimed |
| EP-2791208-A1 | LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE RESINS AND SOLVENT SYSTEM MANUFACTURE | Fujifilm Hunt Chemicals U.S.A., Inc. (US) | 2014-10-22 | — | — | EP | claimed |
| WO-2014149237-A1 | LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE AND POLYAMIDE AMIC ACID RESINS AND COATING SOLUTIONS THEREOF | FUJIFILM HUNT CHEMICALS US, INC. (US) | 2014-09-25 | — | — | WO | claimed |
| US-20130217812-A1 | Low Toxicity Solvent System for Polyamideimide and Polyamide Amic Acid Resins and Coating Solutions Thereof | CYMER-DAYTON, LLC | 2013-08-22 | — | — | US | claimed |
| WO-2013090933-A1 | LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE RESINS AND SOLVENT SYSTEM MANUFACTURE | FUJIFILM HUNT CHEMICALS US, INC. (US) | 2013-06-20 | — | — | WO | claimed |