SCHEMBL7530802

SCHEMBL7530802

CC(Cl)(Cl)c1nc2ccccc2c(=O)[nH]1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.66
TNKS2 Q9H2K2 8/20 0.57
PARP1 P09874 5/20 0.57
QTRT1 Q9BXR0 1/20 0.53
TNKS O95271 6/20 0.52
KMT2A Q03164 2/20 0.50
MEN1 O00255 1/20 0.50
GUSB P08236 3/20 0.49
ALDH1A1 P00352 3/20 0.49
KDM4E B2RXH2 2/20 0.49
PARP2 Q9UGN5 1/20 0.49
TUBB4A P04350 1/20 0.46
TUBB P07437 1/20 0.46
TUBA3C P0DPH7 1/20 0.46
TUBA1B P68363 1/20 0.46
TUBA4A P68366 1/20 0.46
TUBB4B P68371 1/20 0.46
TUBB3 Q13509 1/20 0.46
TUBB2A Q13885 1/20 0.46
TUBB8 Q3ZCM7 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10779491 0.86 PKM (0.70) PKMTNKS2PARP1QTRT1TNKS
SCHEMBL894415 0.86 PKM (0.70) PKMTNKS2PARP1QTRT1TNKS
SCHEMBL29179948 0.83 PKM (0.66) PKMTNKS2PARP1QTRT1TNKS
SCHEMBL7533742 0.81 PKM (0.72) PKMTNKS2PARP1QTRT1TNKS
SCHEMBL29499008 0.81 PKM (0.62) PKMTNKS2PARP1QTRT1TNKS
SCHEMBL18923552 0.81 PKM (0.62) PKMTNKS2PARP1QTRT1TNKS
SCHEMBL3118169 0.79 PKM (1.00) PKMTNKS2PARP1QTRT1TNKS
SCHEMBL30388114 0.79 PKM (1.00) PKMTNKS2PARP1QTRT1TNKS
SCHEMBL29179915 0.78 TNKS2 (0.59) PKMTNKS2PARP1QTRT1TNKS
SCHEMBL29179963 0.77 PKM (0.61) PKMTNKS2PARP1QTRT1TNKS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0801329-B1 RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM PRODUCED THEREFROM CLARIANT FINANCE BVI LTD (VG) 2002-03-27 EP disclosed
US-6110639-A Radiation-sensitive composition and recording medium using the same HOECHST JAPAN LIMITED (JP) 2000-08-29 US disclosed
EP-0801329-A1 RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM PRODUCED THEREFROM HOECHST JAPAN LIMITED (JP) 1997-10-15 EP disclosed