Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.70 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.65 |
| ▸ | MEN1 | O00255 | 2/20 | 0.65 |
| ▸ | GUSB | P08236 | 4/20 | 0.59 |
| ▸ | TNKS2 | Q9H2K2 | 7/20 | 0.56 |
| ▸ | PARP1 | P09874 | 3/20 | 0.56 |
| ▸ | QTRT1 | Q9BXR0 | 1/20 | 0.56 |
| ▸ | TNKS | O95271 | 5/20 | 0.54 |
| ▸ | PARP2 | Q9UGN5 | 1/20 | 0.51 |
| ▸ | LMNA | P02545 | 3/20 | 0.51 |
| ▸ | MAPT | P10636 | 2/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.51 |
| ▸ | RAB9A | P51151 | 3/20 | 0.50 |
| ▸ | NPC1 | O15118 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | CASP3 | P42574 | 1/20 | 0.50 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.50 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.50 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.49 |
| ▸ | TUBB | P07437 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7530802 | 0.86 | PKM (0.66) | PKMKMT2AMEN1GUSBTNKS2 | |
| SCHEMBL7533742 | 0.84 | PKM (0.72) | PKMKMT2AGUSBTNKS2PARP1 | |
| SCHEMBL30388114 | 0.82 | PKM (1.00) | PKMKMT2AGUSBTNKS2PARP1 | |
| SCHEMBL10779491 | 0.82 | PKM (0.70) | PKMKMT2AMEN1TNKS2PARP1 | |
| SCHEMBL3118169 | 0.82 | PKM (1.00) | PKMKMT2AGUSBTNKS2PARP1 | |
| SCHEMBL29179948 | 0.79 | PKM (0.66) | PKMKMT2AGUSBTNKS2PARP1 | |
| SCHEMBL18923552 | 0.77 | PKM (0.62) | PKMKMT2AMEN1GUSBTNKS2 | |
| SCHEMBL29499008 | 0.77 | PKM (0.62) | PKMKMT2AMEN1GUSBTNKS2 | |
| SCHEMBL11800814 | 0.77 | PKM (0.71) | PKMKMT2AGUSBTNKS2PARP1 | |
| SCHEMBL29179907 | 0.76 | PKM (0.60) | PKMKMT2AMEN1GUSBTNKS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0620500-A2 | Resist and pattern formation using the same | HITACHI, LTD. (JP) | 1994-10-19 | — | — | EP | claimed |
| EP-2440034-A1 | HIGH OIL CONTENT PLANTS | Bayer BioScience N.V. (BE) | 2012-04-18 | — | — | EP | disclosed |
| US-20120084883-A1 | High Oil Content Plants | BAYER CROPSCIENCE N.V. (BE) | 2012-04-05 | — | — | US | disclosed |
| WO-2010142424-A1 | HIGH OIL CONTENT PLANTS | BAYER BIOSCIENCE N.V. (BE) | 2010-12-16 | — | — | WO | disclosed |
| EP-0801329-B1 | RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM PRODUCED THEREFROM | CLARIANT FINANCE BVI LTD (VG) | 2002-03-27 | — | — | EP | disclosed |
| US-6110639-A | Radiation-sensitive composition and recording medium using the same | HOECHST JAPAN LIMITED (JP) | 2000-08-29 | — | — | US | disclosed |
| EP-0801329-A1 | RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM PRODUCED THEREFROM | HOECHST JAPAN LIMITED (JP) | 1997-10-15 | — | — | EP | disclosed |
| EP-0534273-B1 | Method for producing a bottom-resist | SIEMENS AG (DE) | 1996-05-15 | — | — | EP | disclosed |
| US-5512334-A | Method for the production of a bottom resist | SIEMENS AKTIENGESELLSCHAFT (DE) | 1996-04-30 | — | — | US | disclosed |
| US-5368901-A | Method for the production of a bottom resist | SIEMENS AKTIENGESELLSCHAFT (DE) | 1994-11-29 | — | — | US | disclosed |
| EP-0620500-A2 | Resist and pattern formation using the same | HITACHI, LTD. (JP) | 1994-10-19 | — | — | EP | disclosed |
| EP-0534273-A1 | Method for producing a bottom-resist | SIEMENS AKTIENGESELLSCHAFT (DE) | 1993-03-31 | — | — | EP | disclosed |
| EP-0313006-B1 | FHOTOPOLYMERIZABLE COMPOSITION COMPRISING AN INITIATOR COMBINATION OF 1,4-OR 9,10-DIMETHOXYANTHRACENE AND A TRIHALOMETHYL-(3H)-QUINAZOLIN-4-ONE | HOECHST CELANESE CORPORATION (US) | 1993-03-17 | — | — | EP | disclosed |
| CN-1048931-A | In the acid hardening photoresist of high resolution, adopt the method for the Photoactive compounds of selecting by near ultraviolet radiation | ROHM & HAAS (US) | 1991-01-30 | — | — | CN | disclosed |
| EP-0404499-A2 | Photosensitive compositions comprising selected photoactive materials and their use in producing high resolution, photoresist images with near ultraviolet radiation | ROHM AND HAAS COMPANY (US) | 1990-12-27 | — | — | EP | disclosed |
| US-4845011-A | BASIFIED ACRIDINE COMPOUND, A TRIAZINE OR QUINAZOLINONE COMPOUND | HOECHST CELANESE CORPORATION (US) | 1989-07-04 | — | — | US | disclosed |
| EP-0313007-A2 | Mixture polymerised by visible light | HOECHST CELANESE CORPORATION (US) | 1989-04-26 | — | — | EP | disclosed |
| EP-0313006-A2 | Fhotopolymerizable composition comprising an initiator combination of 1,4-or 9,10-Dimethoxyanthracene and a trihalomethyl-(3H)-quinazolin-4-one | HOECHST CELANESE CORPORATION (US) | 1989-04-26 | — | — | EP | disclosed |