SCHEMBL7536666

SCHEMBL7536666

O=C(O)C(=CC=Cc1ccco1)C(=O)O

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.67
MASP2 O00187 1/20 0.62
F2 P00734 1/20 0.62
HCAR2 Q8TDS4 1/20 0.58
POLB P06746 6/20 0.50
L3MBTL1 Q9Y468 4/20 0.50
TDP1 Q9NUW8 3/20 0.50
KDM4E B2RXH2 3/20 0.50
KMT2A Q03164 6/20 0.47
TSHR P16473 1/20 0.47
CYP2C19 P33261 1/20 0.47
ALDH1A1 P00352 6/20 0.46
MEN1 O00255 4/20 0.46
RECQL P46063 3/20 0.46
PKM P14618 2/20 0.46
HTT P42858 2/20 0.46
NPC1 O15118 1/20 0.46
MCL1 Q07820 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
RAB9A P51151 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7536662 1.00 MAPT (0.67) MAPTMASP2F2HCAR2POLB
SCHEMBL9364888 0.79 MAPT (0.58) MAPTMASP2F2HCAR2POLB
SCHEMBL9364893 0.79 MAPT (0.58) MAPTMASP2F2HCAR2POLB
SCHEMBL3196199 0.77 MAPT (0.70) MAPTMASP2F2HCAR2POLB
SCHEMBL560439 0.76 MASP2 (1.00) MAPTMASP2F2HCAR2POLB
SCHEMBL560440 0.76 MASP2 (1.00) MAPTMASP2F2HCAR2POLB
SCHEMBL9298138 0.76 F2 (0.67) MAPTMASP2F2HCAR2POLB
SCHEMBL9298131 0.76 F2 (0.67) MAPTMASP2F2HCAR2POLB
SCHEMBL13811198 0.76 MAPT (0.58) MAPTMASP2F2HCAR2POLB
SCHEMBL560500 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4101326-A Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters EASTMAN KODAK COMPANY (US) 1978-07-18 US claimed
EP-0849636-B1 Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element KODAK POLYCHROME GRAPHICS CO (US) 2002-04-10 EP disclosed
US-6270945-B1 BLEND OF PHOTOPOLYMERIZABLE POLYMER AND DYE KODAK POLYCHROME GRAPHICS, LLC 2001-08-07 US disclosed
US-5962189-A Photosensitive composition containing photosensitive polyamide and thiazoline photoinitiator and negative working photosensitive element KODAK POLYCHROME GRAPHICS LLC (US) 1999-10-05 US disclosed
US-5925498-A Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates KODAK POLYCHROME GRAPHICS LLC (US) 1999-07-20 US disclosed
US-5879858-A COMPOSITION COMPRISING RESIN CONTAINING UNSATURATED PHOTOCROSSLINKABLE GROUPS, PHOTOPOLYMERIZABLE MONOMER, PHOTOCROSSLINKABLE POLYESTER RESIN, PHOTOINITIATOR KODAK POLYCHROME GRAPHICS, LLC (US) 1999-03-09 US disclosed
WO-1998058296-A1 PHOTOSENSITIVE POLYMER COMPOSITION AND ELEMENT CONTAINING PHOTOSENSITIVE POLYAMIDE AND MIXTURE OF ACRYLATES KODAK POLYCHROME GRAPHICS, L.L.C. (US) 1998-12-23 WO disclosed
US-5821032-A A PHOTOCURABLE FORMULATION CONTAINS ETHYLENICALLY UNSATURATED PHOTOCROSSLINKABLE GROUPS, AN ETHYLENICALLY UNSATURATED PHOTOPOLYMERIZABLE MONOMER, A CROSSLINKABLE POLYESTER, CROSSLINKABLE STYRENE-MALEIC ANHYDRIDE AND PHOTOINITIATOR KODAK POLYCHROME GRAPHICS, LLC (US) 1998-10-13 US disclosed
EP-0849636-A1 Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element EASTMAN KODAK COMPANY (US) 1998-06-24 EP disclosed
EP-0576622-B1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK CO (US) 1997-11-05 EP disclosed
US-4647346-A IMPROVED ABRASION RESISTANCE EASTMAN KODAK COMPANY (US) 1987-03-03 US disclosed
US-4640886-A ANODIZED, SILICATED ALUMINUM SUPPORT, RADIATION SENSITIVE POLYESTER, BENZOIC ACID LAYERS TO IMPROVE INCUBATION STABILITY EASTMAN KODAK COMPANY (US) 1987-02-03 US disclosed
EP-0199467-A1 Polyesters comprising recurring photoconductive and photocrosslinkable units and elements thereof EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1986-10-29 EP disclosed
US-4609606-A LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1986-09-02 US disclosed
EP-0070898-B1 IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1985-10-16 EP disclosed
US-4419437-A SULFONIMIDE-CONTAINING AROMATIC DICARBOXYLIC ACID EASTMAN KODAK COMPANY (US) 1983-12-06 US disclosed
EP-0070898-A4 IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS. EASTMAN KODAK CO (US) 1983-07-04 EP disclosed
EP-0070898-A1 IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS. EASTMAN KODAK CO (US) 1983-02-09 EP disclosed
WO-1982002780-A1 IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS EASTMAN KODAK CO (US) 1982-08-19 WO disclosed
US-4101326-A Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters EASTMAN KODAK COMPANY (US) 1978-07-18 US disclosed