SCHEMBL7536672

SCHEMBL7536672

COCO[C](C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11889609 0.76 TSHR (0.34)
SCHEMBL3698959 0.74 ALDH1A1 (0.31)
SCHEMBL13516087 0.71 ALDH1A1 (0.38)
SCHEMBL444611 0.70 ABCB11 (0.33)
SCHEMBL13446140 0.69 ALDH1A1 (0.31)
SCHEMBL219550 0.67 ALDH1A1 (0.30)
SCHEMBL14991316 0.67
SCHEMBL588586 0.65
SCHEMBL13446142 0.65
SCHEMBL596238 0.65 HTT (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020160297-A1 Low abosorbing resists for 157 nm lithography AIR FORCE, UNITED STATES 2002-10-31 US claimed
WO-2002069043-A2 LOW ABSORBING RESISTS FOR 157 NM LITHOGRAPHY MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2002-09-06 WO claimed