Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5012424 | 0.82 | THRB (0.37) | — | |
| SCHEMBL17424500 | 0.81 | — | — | |
| SCHEMBL6716389 | 0.80 | THRB (0.40) | ALDH1A1 | |
| SCHEMBL14453566 | 0.79 | TSHR (0.33) | — | |
| SCHEMBL304056 | 0.78 | ALDH1A1 (0.47) | ALDH1A1MAPT | |
| SCHEMBL15024605 | 0.77 | THRB (0.42) | ALDH1A1 | |
| SCHEMBL2774742 | 0.76 | — | — | |
| SCHEMBL5142904 | 0.76 | — | — | |
| SCHEMBL26109669 | 0.76 | — | — | |
| SCHEMBL17249947 | 0.75 | ALDH1A1 (0.33) | ALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9733564-B2 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-9188857-B2 | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-8614283-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2013-12-24 | — | — | US | disclosed |
| US-8580481-B2 | Resist polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2013-11-12 | — | — | US | disclosed |
| US-20130252181-A1 | RESIST POLYMER, PROCESS FOR PRODUCTION THEREOF, RESIST COMPOSITION, AND PROCESS FOR PRODUCTION OF SUBSTRATES WITH PATTERNS THEREON | MITSUBISHI RAYON CO., LTD. (JP) | 2013-09-26 | — | — | US | disclosed |
| US-20130224654-A1 | COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST COMPOSITION, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREUPON, METHOD FOR EVALUATING COPOLYMERS, AND METHOD FOR ANALYZING COPOLYMER COMPOSITIONS | MITSUBISHI RAYON CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-8476401-B2 | Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-20120315459-A1 | CARBON NANOTUBE SHEET AND PROCESS FOR PRODUCTION THEREOF | TAIYO NIPPON SANSO CORPORATION (JP) | 2012-12-13 | — | — | US | disclosed |
| US-8241829-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2012-08-14 | — | — | US | disclosed |
| US-8114949-B2 | (Meth)acrylate, polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2012-02-14 | — | — | US | disclosed |
| US-7378218-B2 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-27 | — | — | US | disclosed |
| US-20080032241-A1 | Resist Polymer, Process For Production Thereof, Resist Composition, And Process For Production Of Substrated With Patterns Thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2008-02-07 | — | — | US | disclosed |
| US-20080003529-A1 | (Meth)Acrylate, Polymer and Resist Composition | MITSUBISHI RAYON CO., LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| US-7232917-B2 | Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-06-19 | — | — | US | disclosed |
| US-7232917-B2 | Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-06-19 | — | — | US | disclosed |
| US-20060127801-A1 | Resist polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2006-06-15 | — | — | US | disclosed |
| US-20040161710-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-08-19 | — | — | US | disclosed |
| US-6603037-B2 | Acrylic esters containing fluorine at alpha -position and having an alkoxymethyl group introduced into the ester side chain thereof are novel. Polymers obtained from the acrylic esters are improved in transparency, acid elimination and | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-08-05 | — | — | US | disclosed |
| US-20030100791-A1 | NOVEL ESTER COMPOUNDS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030100791-A1 | NOVEL ESTER COMPOUNDS | VCL, CAD, ELOVL1 | ALDH1A1 270/4885MAPT 3427/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.