SCHEMBL7539291

SCHEMBL7539291

CCCCCc1ccc(/C=C/c2ccccc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYSLTR2 Q9NS75 3/20 0.53
CYSLTR1 Q9Y271 3/20 0.53
PLA2G1B P04054 2/20 0.53
TRPA1 O75762 1/20 0.53
TRPM2 O94759 1/20 0.53
TRPM8 Q7Z2W7 1/20 0.53
HTR2A P28223 2/20 0.51
ALDH1A1 P00352 2/20 0.50
ESR1 P03372 2/20 0.50
ADRA2A P08913 2/20 0.50
ADORA3 P0DMS8 2/20 0.50
TACR2 P21452 2/20 0.50
SLC6A2 P23975 2/20 0.50
SLC6A4 P31645 2/20 0.50
SLC6A3 Q01959 2/20 0.50
CYP3A4 P08684 2/20 0.50
KCNH2 Q12809 1/20 0.50
KDM4E B2RXH2 1/20 0.50
LMNA P02545 1/20 0.50
SHBG P04278 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7539299 1.00 CYSLTR2 (0.53) CYSLTR2CYSLTR1PLA2G1BTRPA1TRPM2
SCHEMBL7537266 0.98 HTR2A (0.54) CYSLTR2CYSLTR1PLA2G1BTRPA1TRPM2
SCHEMBL7537271 0.98 HTR2A (0.54) CYSLTR2CYSLTR1PLA2G1BTRPA1TRPM2
SCHEMBL7538660 0.94 HSD11B1 (0.49) CYSLTR2CYSLTR1PLA2G1BTRPA1TRPM2
SCHEMBL6546888 0.94 HSD11B1 (0.49) CYSLTR2CYSLTR1PLA2G1BTRPA1TRPM2
SCHEMBL30312758 0.94 HSD11B1 (0.49) CYSLTR2CYSLTR1PLA2G1BTRPA1TRPM2
SCHEMBL13108027 0.90 KCNH2 (0.50) CYSLTR2CYSLTR1PLA2G1BTRPA1TRPM2
SCHEMBL27800035 0.89 RARB (0.53) CYSLTR2CYSLTR1PLA2G1BTRPA1TRPM2
SCHEMBL2494330 0.89 CYSLTR2 (0.49) CYSLTR2CYSLTR1PLA2G1BTRPA1TRPM2
SCHEMBL14227372 0.89 KCNH2 (0.49) CYSLTR2CYSLTR1PLA2G1BTRPA1TRPM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020015906-A1 Polymer for photoresist, method of production thereof and photoresist composition containing polymer SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-02-07 US disclosed