SCHEMBL7539355

SCHEMBL7539355

C=Cc1ccc(OC(C)OCC(CC)CCCC)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.44
TSHR P16473 3/20 0.40
ALDH1A1 P00352 6/20 0.37
CYP3A4 P08684 5/20 0.37
CA2 P00918 1/20 0.37
L3MBTL1 Q9Y468 2/20 0.35
LMNA P02545 4/20 0.34
CHRNB2 P17787 1/20 0.34
CHRNB4 P30926 1/20 0.34
CHRNA3 P32297 1/20 0.34
CHRNA7 P36544 1/20 0.34
CHRNA4 P43681 1/20 0.34
MAPK1 P28482 2/20 0.34
HSD17B10 Q99714 1/20 0.34
AHR P35869 1/20 0.33
PRSS1 P07477 1/20 0.33
PRSS2 P07478 1/20 0.33
PRSS3 P35030 1/20 0.33
ATM Q13315 1/20 0.33
TAS1R3 Q7RTX0 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1356997 0.86 ALDH1A1 (0.40) TDP1TSHRALDH1A1CYP3A4CA2
Ethylene SCHEMBL27857492 0.82 ALDH1A1 (0.46) TDP1TSHRALDH1A1CYP3A4CA2
SCHEMBL28207730 0.82 TDP1 (0.48) TDP1TSHRALDH1A1CYP3A4CA2
SCHEMBL5900997 0.82 CHRNB2 (0.43) ALDH1A1CYP3A4CHRNB2CHRNB4CHRNA3
SCHEMBL29015274 0.81 TDP1 (0.40) TDP1TSHRALDH1A1CYP3A4CA2
SCHEMBL18532427 0.80 CHRNB2 (0.35) TDP1CHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL5900972 0.79 CHRNB2 (0.41) TSHRCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL686095 0.78 CHRNB2 (0.38) TDP1TSHRALDH1A1CYP3A4LMNA
SCHEMBL5900977 0.78 CHRNB2 (0.40) TSHRLMNACHRNB2CHRNB4CHRNA3
SCHEMBL7108080 0.78 CHRNB2 (0.40) TSHRLMNACHRNB2CHRNB4CHRNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119937243-A Chemically amplified positive photosensitive resin composition, cured film, and element having cured film 奇美实业股份有限公司 2025-05-06 CN disclosed
CN-116360211-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2023-06-30 CN disclosed
CN-115437214-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2022-12-06 CN disclosed
CN-113126435-A Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2021-07-16 CN disclosed
CN-112394618-A Chemically amplified positive photosensitive resin composition, and protective film and member produced therefrom 奇美实业股份有限公司 2021-02-23 CN disclosed
CN-111999980-A Chemically amplified positive photosensitive resin composition, protective film and module 奇美实业股份有限公司 2020-11-27 CN disclosed
CN-111381442-A Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2020-07-07 CN disclosed
CN-111381438-A Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2020-07-07 CN disclosed
CN-111324013-A Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2020-06-23 CN disclosed
US-20020015906-A1 Polymer for photoresist, method of production thereof and photoresist composition containing polymer SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-02-07 US disclosed