SCHEMBL7541463

SCHEMBL7541463

O=S(=O)(c1ccccc1)C1(S(=O)(=O)c2ccccc2)CC=CC1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.63
MCOLN3 Q8TDD5 1/20 0.63
HTR6 P50406 1/20 0.44
EEF2K O00418 1/20 0.42
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.41
CA1 P00915 2/20 0.41
CA2 P00918 2/20 0.41
ALDH1A1 P00352 1/20 0.41
HSD17B10 Q99714 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
CA12 O43570 1/20 0.41
CA3 P07451 1/20 0.41
CA4 P22748 1/20 0.41
CA6 P23280 1/20 0.41
CA5A P35218 1/20 0.41
CA7 P43166 1/20 0.41
PLA2G7 Q13093 1/20 0.41
CA9 Q16790 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16865174 0.81 GAA (0.83) GAAMCOLN3HTR6EEF2KSMN1; SMN2
SCHEMBL6099547 0.77 GAA (0.91) GAAMCOLN3HTR6EEF2KSMN1; SMN2
SCHEMBL3193854 0.77 GAA (1.00) GAAMCOLN3HTR6EEF2KSMN1; SMN2
SCHEMBL7541549 0.76 GAA (0.96) GAAMCOLN3HTR6EEF2KSMN1; SMN2
SCHEMBL3193960 0.76 GAA (0.96) GAAMCOLN3HTR6EEF2KSMN1; SMN2
SCHEMBL12440542 0.74 GAA (0.44) GAAMCOLN3HTR6NPC1RAB9A
SCHEMBL28433748 0.71 GAA (0.56) GAAMCOLN3HTR6SMN1; SMN2CA1
SCHEMBL7541828 0.70 GAA (0.44) GAAMCOLN3HTR6NPC1RAB9A
SCHEMBL8396917 0.68 GAA (0.57) GAAMCOLN3HTR6EEF2KSMN1; SMN2
SCHEMBL22026800 0.68 GAA (0.52) GAAMCOLN3HTR6RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP claimed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US claimed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP claimed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP disclosed