SCHEMBL7541828

SCHEMBL7541828

O=S(=O)(c1ccccc1)C1(S(=O)(=O)c2ccccc2)C=CC=CC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.44
MCOLN3 Q8TDD5 1/20 0.44
HTR6 P50406 1/20 0.37
CYP2C9 P11712 2/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 1/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
ALDH1A1 P00352 1/20 0.34
HSD17B10 Q99714 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA3 P07451 1/20 0.34
CA4 P22748 1/20 0.34
CA6 P23280 1/20 0.34
CA5A P35218 1/20 0.34
CA7 P43166 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6733797 0.82 LMNA (0.39) GAACA12CA1CA2CA7
SCHEMBL7542387 0.78 KIF11 (0.40) ALDH1A1CA12CA1CA2CA9
SCHEMBL29103845 0.77 GAA (0.41) GAAMCOLN3HTR6CYP2C9CYP3A4
SCHEMBL28270256 0.75 GAA (0.39) GAAMCOLN3HTR6CYP2C9CYP3A4
SCHEMBL7549639 0.72 GAA (0.50) GAAMCOLN3HTR6CYP2D6ALDH1A1
(Phenylsulfonyl)Benzene SCHEMBL29253760 0.71 HTR6 (0.48) GAAMCOLN3HTR6CYP2C9CYP3A4
SCHEMBL7541737 0.71 GAA (0.48) GAAMCOLN3HTR6CYP2C9CYP3A4
SCHEMBL7541463 0.70 GAA (0.63) GAAMCOLN3HTR6CYP2C9NPC1
SCHEMBL28077295 0.67
Hydrochloric Acid SCHEMBL27762322 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP claimed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US claimed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP claimed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP disclosed