SCHEMBL7543056

SCHEMBL7543056

CC(C)OC(=O)C=CC(=O)OC12CC3CC(CC(C3)C1(C)C)C2

nearest known ligand 0.40

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 1/20 0.40
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
THRB P10828 1/20 0.32
HTT P42858 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
EPHX2 P34913 1/20 0.32
CA12 O43570 1/20 0.31
AKR1B10 O60218 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
AKR1B1 P15121 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
CA14 Q9ULX7 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7543047 1.00 HCAR2 (0.40) HCAR2ALDH1A1LMNATHRBHTT
SCHEMBL7539563 0.90 THRB (0.37) ALDH1A1LMNATHRBHTTSMN1; SMN2
SCHEMBL7539568 0.90 THRB (0.37) ALDH1A1LMNATHRBHTTSMN1; SMN2
SCHEMBL7543054 0.81 HCAR2 (0.40) HCAR2ALDH1A1LMNATHRBHTT
SCHEMBL7538695 0.79 HCAR2 (0.47) HCAR2ALDH1A1LMNATHRBHTT
SCHEMBL7538700 0.79 HCAR2 (0.47) HCAR2ALDH1A1LMNATHRBHTT
SCHEMBL35446 0.78 SCN1A (0.32)
SCHEMBL8102046 0.70 ALDH1A1 (0.31) ALDH1A1LMNATHRBHTTSMN1; SMN2
SCHEMBL3182587 0.69 SCN1A (0.32) ALDH1A1
SCHEMBL7539565 0.68 THRB (0.37) ALDH1A1LMNATHRBHTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020190818-A1 High frequency band pass filter TDK CORPORATION (JP) 2002-12-19 US disclosed
EP-0788118-B1 Low dielectric polymer and film, substrate and electronic part using the same TDK CORP (JP) 2002-11-20 EP disclosed
US-5914283-A FUMARIC ACID DIESTER MONOMER-CONTAINING POLYMER FILM; HEAT RESISTANCE, WEATHER RESISTANCE TDK CORPORATION (JP) 1999-06-22 US disclosed
EP-0788118-A1 Low dielectric polymer and film, substrate and electronic part using the same TDK Corporation (JP) 1997-08-06 EP disclosed