SCHEMBL755361

SCHEMBL755361

CS(=O)(=O)O.[SnH2]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29222732 0.95 — —
SCHEMBL8596055 0.94 CA2 (0.58) —
SCHEMBL246838 0.94 CA2 (0.58) —
SCHEMBL15109974 0.94 — —
SCHEMBL25599 0.94 CA2 (0.58) —
SCHEMBL128169 0.94 — —
SCHEMBL105 0.94 — —
SCHEMBL28040348 0.91 — —
SCHEMBL20570028 0.89 — —
SCHEMBL20570964 0.89 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 937 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122013269-A Electroplating method of low-pore nanoscale bright tin layer 惠州祥奇科技有限公司 2026-05-12 — — CN claimed
CN-117816641-B Washing device for stannous methanesulfonate crystal preparation and use method 广西华锡有色金属股份有限公司 2026-05-12 — — CN claimed
CN-119930478-A Method for rapidly preparing stannous methanesulfonate 柳州华锡有色设计研究院有限责任公司 2025-05-06 — — CN claimed
CN-116237038-B Catalyst for preparing p-bromoxynil by ammoxidation method, preparation method and application 中南民族大学 2025-04-18 — — CN claimed
CN-119772447-A Preparation method and application of polymer copper powder mixed core solder ball 上海锡喜材料科技有限公司 2025-04-08 — — CN claimed
CN-119753770-A Cyanide-free tinning electroplating solution and preparation method thereof 龙腾半导体股份有限公司 2025-04-04 — — CN claimed
CN-115948775-B Methanesulfonic acid high-speed tinning liquid for high-speed tinning and preparation method thereof 广州三孚新材料科技股份有限公司 2025-04-01 — — CN claimed
CN-118531447-B Dense and smooth metal tin based on methylsulfonic acid system and preparation method thereof 中南大学 2025-03-25 — — CN claimed
CN-119617800-A Stannous methanesulfonate microwave vacuum drying method 柳州华锡有色设计研究院有限责任公司 2025-03-14 — — CN claimed
CN-118854386-B Environment-friendly acidic tinning electrolyte and environment-friendly tinning process implemented by using same 中山市康迪斯威科技有限公司 2025-03-11 — — CN claimed
CN-101503811-A Method for electroplating shaft bushing antifriction layer by metilsulfate plating bath UNIV JIAYING (CN) 2009-08-12 — — CN claimed
CN-101476150-A Device and method for electroplating Sn-Cu alloy GUANGZHOU ELECTRIC APPARATUS R (CN) 2009-07-08 — — CN claimed
US-20090081370-A1 METHOD FOR COATING SUBSTRATES CONTAINING ANTIMONY COMPOUNDS WITH TIN AND TIN ALLOYS ATOTECH DEUTSCHLAND GMBH (DE) 2009-03-26 — — US claimed
CN-101235000-A Production of stannous methylsulfonate for micro-electronics in tower-type reaction device by using tin flower as raw material TIANJIN CONWALT SCIENCE AND TE (CN) 2008-08-06 — — CN claimed
US-7309411-B2 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys CITIBANK, N.A. 2007-12-18 — — US claimed
CN-1657520-A Process for preparing methyl stannous sulfonate using tin powder RES DESIGN INST YUNNAN TIN IND (CN) 2005-08-24 — — CN claimed
EP-1430166-A2 ELECTROLYTE MEDIA FOR THE DEPOSITION OF TIN ALLOYS AND METHODS FOR DEPOSITING TIN ALLOYS MacDermid Plc (GB) 2004-06-23 — — EP claimed
US-20040065558-A1 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys CITIBANK, N.A. 2004-04-08 — — US claimed
WO-2002072923-A2 ELECTROLYTE MEDIA FOR THE DEPOSITION OF TIN ALLOYS AND METHODS FOR DEPOSITING TIN ALLOYS MACDERMID PLC (GB) 2002-09-19 — — WO claimed
US-6176996-B1 TIN ALLOY ELECTROPLATING BATH CONTAINING A TIN SALT, BISMUTH, METHANESULFONIC ACID, A CONDUCTIVE COMPOUND AND A LIGAND N,N,N',N'-TETRAKIS(2-HYDROXYPROPYL)ETHYLENEDIAMINE OR N,N,N'N'-TETRAKIS(2-PYRIDYLMETHYLPROPYL)ETHYLENEDIAMINE MOON SUNGSOO (KR) 2001-01-23 — — US claimed
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