SCHEMBL7558004

SCHEMBL7558004

CC(=O)c1cc(C(C)=O)c(N)c(C(=O)O)c1

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.47
AKR1C3 P42330 13/20 0.44
AKR1C2 P52895 13/20 0.44
CA5A P35218 1/20 0.41
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
AKR1B10 O60218 2/20 0.38
AKR1B1 P15121 2/20 0.38
AKR1C4 P17516 2/20 0.38
AKR1C1 Q04828 2/20 0.38
NPC1 O15118 1/20 0.37
MAPT P10636 1/20 0.37
RAB9A P51151 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28382276 0.91 CA5A (0.48) AKR1C3AKR1C2CA5AKMT2ANPC1
SCHEMBL11694826 0.86 KDM4E (0.46) KDM4EAKR1C3AKR1C2CA5AMEN1
SCHEMBL27868371 0.82 CYP3A4 (0.55) KDM4EAKR1C3AKR1C2MEN1KMT2A
SCHEMBL1551912 0.80 KDM4E (0.50) KDM4ECA5AMEN1KMT2ATDP1
SCHEMBL8374425 0.79 CA5A (0.46) KDM4ECA5AMEN1KMT2AMAPT
SCHEMBL28902260 0.78 KDM4E (0.48) KDM4EAKR1C3MEN1KMT2ATDP1
SCHEMBL8377063 0.76 LMNA (0.46) KDM4EAKR1C3AKR1C2CA5AMAPT
SCHEMBL10763288 0.76 MMP2 (0.46) KDM4EAKR1C3AKR1C2CA5AMEN1
SCHEMBL18485647 0.76 CA5A (0.46) AKR1C3AKR1C2CA5AAKR1B10AKR1B1
SCHEMBL27733846 0.76 KDM4E (0.47) KDM4EAKR1C3AKR1C2CA5AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114478295-B Synthesis method of diatrizoic acid 浙江海洲制药有限公司 2023-12-15 CN disclosed
EP-0903633-B1 Heat-developable color light-sensitive material FUJI PHOTO FILM CO LTD (JP) 2002-07-24 EP disclosed
US-6127088-A IMAGE-FORMING PROCESS COMPRISING HEATING HEAT DEVELOPABLE COLOR LIGHT-SENSITIVE MATERIAL WITH OR AFTER IMAGEWISE EXPOSURE, SAID MATERIAL COMPRISING SUPPORT BEARING SILVER HALIDE EMULSION LAYER AND CONTAINING SPECIFIED DYE PRECURSOR FUJI PHOTO FILM CO., LTD. (JP) 2000-10-03 US disclosed
EP-0620490-B1 Silver halide light-sensitive material FUJI PHOTO FILM CO LTD (JP) 1999-09-01 EP disclosed
EP-0903633-A1 Heat-developable color light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1999-03-24 EP disclosed
US-5585231-A DISPERSE DYES IN PHOTOGRAPHIC FILMS FUJI PHOTO FILM CO., LTD. (JP) 1996-12-17 US disclosed
US-5543279-A SMALL FLUCTUATION IN SENSITIVITY WITH TEMPERATURE CHANGE FUJI PHOTO FILM CO., LTD. (JP) 1996-08-06 US disclosed
EP-0620490-A1 Silver halide light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1994-10-19 EP disclosed
EP-0620491-A1 Heat developable color light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1994-10-19 EP disclosed