Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Di(Hydroxyethyl)Ether. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | PEPD | P12955 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 2/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | BTN3A1 | O00481 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Triethylene Glycol SCHEMBL31754154 | 0.98 | MEN1 (0.44) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Triethylene Glycol SCHEMBL7551681 | 0.98 | MEN1 (0.44) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Di(Hydroxyethyl)Ether SCHEMBL33375 | 0.91 | TSHR (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Di(Hydroxyethyl)Ether SCHEMBL5169334 | 0.91 | TSHR (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Di(Hydroxyethyl)Ether SCHEMBL24262 | 0.91 | TSHR (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Di(Hydroxyethyl)Ether SCHEMBL9839735 | 0.91 | TSHR (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Di(Hydroxyethyl)Ether SCHEMBL10495579 | 0.91 | TSHR (0.50) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Di(Hydroxyethyl)Ether SCHEMBL8659237 | 0.89 | TSHR (0.48) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Methacrylic Acid SCHEMBL478108 | 0.89 | MEN1 (0.52) | TSHRMAPK1MEN1KMT2AALDH1A1 | |
| Methacrylic Acid SCHEMBL9485971 | 0.89 | MEN1 (0.52) | TSHRMAPK1MEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110790872-B | Viscosity-reducing polycarboxylate superplasticizer with micro-crosslinking structure and preparation method thereof | 中建西部建设股份有限公司 | 2022-08-05 | — | — | CN | claimed |
| CN-110790872-A | Viscosity-reducing polycarboxylate superplasticizer with micro-crosslinking structure and preparation method thereof | 中建西部建设股份有限公司 | 2020-02-14 | — | — | CN | claimed |
| CN-110790872-B | Viscosity-reducing polycarboxylate superplasticizer with micro-crosslinking structure and preparation method thereof | 中建西部建设股份有限公司 | 2022-08-05 | — | — | CN | disclosed |
| CN-110790872-A | Viscosity-reducing polycarboxylate superplasticizer with micro-crosslinking structure and preparation method thereof | 中建西部建设股份有限公司 | 2020-02-14 | — | — | CN | disclosed |
| CN-102470664-B | Lithographic printing plate precursor and stack | EASTMAN KODAK CO | 2014-07-02 | — | — | CN | disclosed |
| CN-102470664-A | Lithographic printing plate precursor and stack | EASTMAN KODAK CO | 2012-05-23 | — | — | CN | disclosed |
| EP-0740214-B1 | Photosensitive composition and photosensitive rubber plate | ZEON CORP (JP) | 2002-07-10 | — | — | EP | disclosed |
| EP-0699961-B1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RUBBER PLATE AND PROCESS FOR PRODUCING THE PLATE, AND FLEXOGRAPHIC PLATE AND PROCESS FOR PRODUCING THE PLATE | NIPPON ZEON CO (JP) | 2000-11-15 | — | — | EP | disclosed |
| US-5863704-A | BLENDS OF DIENE-AROMATIC VINYL COPOLYMER BLOCKS, PHOTOPOLYMERIZABLE ETHYLENICALLY UNSATURATED MONOMER AND PHOTOINITIATOR | NIPPON ZEON COMPANY, LTD. (JP) | 1999-01-26 | — | — | US | disclosed |
| US-5679485-A | CURABLE ELASTIC BLEND CONTAINING HYDROPHOBIC ADDITION POLYMER HAVING PENDANT HYDROPHILIC PHOSPHATE GROUPS; AQUEOUS DEVELOPMENT OF IMAGE | NIPPON ZEON CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| EP-0751433-A2 | Release composition and photosensitive rubber plate with layer of the same | NIPPON ZEON CO., LTD. (JP) | 1997-01-02 | — | — | EP | disclosed |
| EP-0740214-A2 | Photosensitive composition and photosensitive rubber plate | NIPPON ZEON CO., LTD. (JP) | 1996-10-30 | — | — | EP | disclosed |
| EP-0699961-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RUBBER PLATE AND PROCESS FOR PRODUCING THE PLATE, AND FLEXOGRAPHIC PLATE AND PROCESS FOR PRODUCING THE PLATE | NIPPON ZEON CO., LTD. (JP) | 1996-03-06 | — | — | EP | disclosed |